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US 11,127,564 B2Granted
Scanning electron microscope with objective lens below sample stage
AssigneeKkt Holdings Syndicate
InventorsTzu-Yi Kuo, Yu-Kuang Tseng
Life of this patent
Estimating the term…
Abstract
An immersion objective lens is configured below a stage such that multiple detectors can be configured above sample for large beam current application, particularly for defect inspection. Central pole piece of the immersion objective lens thus can be provided that a magnetic monopole-like field can be provided for electron beam. Auger electron detector thus can be configured to analyze materials of sample in the defect inspection.
Claims20
A charged particle beam apparatus, comprising:
- a charged particle source for providing a charged particle beam;
- a condenser lens for condensing the charged particle beam;
- a scanning unit for scanning the charged particle beam on a sample;
- a stage including an electrostatic chuck for supporting the sample, a first mesa movable in a first direction, and a second mesa movable in a second direction, wherein the first direction is different from the second direction;
- a detector system for receiving signal particles from the sample after the charged particle beam impinges on the sample;
- and
- an objective lens, below said electrostatic chuck stage, including a central polepiece aligned to the charged particle beam for focusing the charged particle beam on the sample, wherein the central polepiece protrudes through the first mesa and the second mesa and is located below and adjacent to the electrostatic chuck.
4 more elements
An electron beam apparatus, comprising:
- an electron source for providing an electron beam;
- a condenser lens for condensing the electron beam;
- a scanning unit for scanning the charged particle beam on a sample;
- a first objective lens below said condenser lens for focusing the electron beam;
- a maglev stage, below said first objective lens, including an electrostatic chuck for supporting the sample, a first mesa movable in a first direction, and a second mesa movable in a second direction, wherein the first direction is orthogonal to the second direction;
- a detector system for receiving signal electrons from the sample after the electron beam impinges on the sample;
- and
- a second objective lens, below said electrostatic chuck, including a central polepiece, aligned to the charged particle beam and protruding towards the sample, for focusing the electron beam on the sample, wherein the central polepiece protrudes through the first mesa and the second mesa and is located below and adjacent to the electrostatic chuck.
5 more elements
Dependencies are inferred from the claim text.