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US 11,004,652 B2Granted
Ion milling device
AssigneeHitachi High-Tech Corporation
InventorsAsako Kaneko, Hisayuki Takasu
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Abstract
An object of the present invention is to provide a technique for reducing a phenomenon in which fine particles derived from a sample and bounced off by ion beam irradiation are reattached to an ion milling surface. An ion milling device of the invention includes an ion source which emits an ion beam, a chamber, a sample table in which a sample is placed in the chamber, and a shielding plate placed on the sample, and by having a magnet disposed in the chamber, reattachment of fine particles derived from the sample can be reduced.
Claims9
An ion milling device, comprising:
- a chamber;
- a sample table made of a non-magnetic material and on which a sample is placed in the chamber;
- a shielding plate placed on the sample;
- and
- an ion source which is placed so as to face an upper surface of the sample table and emits an ion beam, wherein
- a magnet holding plate made of a non-magnetic material in which a first magnet is detachably disposed on the upper surface of the sample table and the sample is placed on an upper surface of the magnet holding plate when the first magnet is disposed on the sample table.
3 more elements
Dependencies are inferred from the claim text.