H01J 2237/184
Vacuum locks
H01J2237/184 (Vacuum locks) appears on 101 US grants and 107 published applications in this corpus.
Search patents in H01J- Granted patents
- 101
- Published applications
- 107
- Assignees
- 49
- Inventors
- 286
- Latest grant
- 1 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 5 | 0 |
| 1997 | 0 | 0 |
| 1998 | 6 | 0 |
| 1999 | 4 | 0 |
| 2000 | 3 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 1 | 2 |
| 2004 | 2 | 0 |
| 2005 | 0 | 1 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 3 |
| 2009 | 0 | 2 |
| 2010 | 1 | 6 |
| 2011 | 3 | 4 |
| 2012 | 2 | 3 |
| 2013 | 2 | 2 |
| 2014 | 7 | 7 |
| 2015 | 4 | 5 |
| 2016 | 4 | 4 |
| 2017 | 4 | 6 |
| 2018 | 3 | 0 |
| 2019 | 3 | 3 |
| 2020 | 7 | 10 |
| 2021 | 5 | 10 |
| 2022 | 7 | 7 |
| 2023 | 8 | 11 |
| 2024 | 6 | 8 |
| 2025 | 5 | 3 |
| 2026 | 4 | 10 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Substrate processing system and particle removal method1 Sep 2026US 12,725,769 B2Tokyo Electron Limited
- Charged particle beam device and sample analysis method9 Jun 2026US 12,651,723 B2Hitachi High-Tech Corporation
- Actuator arrangement and electron-optical column21 Apr 2026US 12,609,265 B2ASML Netherlands B. V.
- Workstation, preparation station and method for manipulating an electron microscopy grid assembly17 Mar 2026US 12,580,149 B2Max-Planck-Gesellschaft Zur FöRderung Der Wissenschaften E. V.
- Vacuum chamber and cabin door structure2 Dec 2025US 12,488,977 B2Zybio Inc.
- Workstation, preparation station and method for manipulating an electron microscopy grid assembly3 Sep 2026US 2026/0260839 A1Max-Planck-Gesellschaft Zur FöRderung Der Wissenschaften E. V.
- Method for operating a particle beam system, and particle beam system13 Aug 2026US 2026/0237592 A1
- Charged Particle Beam Device30 Jul 2026US 2026/0221377 A1Hitachi High-Tech Corporation
- High-throughput load lock chamber23 Jul 2026US 2026/0213119 A1ASML Netherlands B. V.
- System and method for a workstation for handling electron microscopy specimens in variable environments16 Jul 2026US 2026/0204512 A1Simple Origin, Inc.
Most cited
By later US patents
- Electron beam inspection system and method257US 5,502,306 AKLA Instruments Corporation · 1996
- Method for plasma etching tungsten94US 4,838,990 ATexas Instruments Incorporated · 1989
- End station for a parallel beam ion implanter69US 5,229,615 AEaton Corporation · 1993
- Plasma process system and method52US 5,494,522 ATokyo Electron Limited · 1996
- Fluid flow control method and apparatus for an ion implanter47US 5,308,989 AEaton Corporation · 1994