Charged particle beam device and sample analysis method
AssigneeHitachi High-Tech Corporation
InventorsMasayoshi Yoshioka, Naoki Sakamoto, Shinya Kitayama
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AssigneeHitachi High-Tech Corporation
InventorsMasayoshi Yoshioka, Naoki Sakamoto, Shinya Kitayama
Estimating the term…
A charged particle beam device 1 includes analysis means performed by a controller when a sample holder HL holding a sample SAM is installed on a stage 23. The analysis means includes a step (a) of raising a degree of vacuum of each of an observation chamber 10 and a preprocessing chamber 20 by opening a gate valve VL5, opening a valve VL1, closing a valve VL2, and driving a vacuum pump 40, a step (b) of closing the gate valve VL5 and opening the valve VL2 after the step (a), and a step (c) of processing the sample SAM by radiating an ion beam from an ion source 22 to the sample SAM while performing vacuum exhaust of the preprocessing chamber 20 by the vacuum pump 40 after the step (b). The analysis means can process the sample SAM quickly after performing the vacuum exhaust of the preprocessing chamber 20 in a short time.
A charged particle beam device comprising:
A charged particle beam device comprising:
A sample analysis method performed using a charged particle beam device including:
Dependencies are inferred from the claim text.