H01J 2237/1523
Prisms
H01J2237/1523 (Prisms) appears on 20 US grants and 20 published applications in this corpus.
Search patents in H01J- Granted patents
- 20
- Published applications
- 20
- Assignees
- 20
- Inventors
- 45
- Latest grant
- 8 Oct 2024
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2004 | 0 | 1 |
| 2005 | 1 | 0 |
| 2006 | 1 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 1 |
| 2009 | 0 | 2 |
| 2010 | 0 | 2 |
| 2011 | 2 | 2 |
| 2012 | 3 | 2 |
| 2013 | 0 | 3 |
| 2014 | 4 | 1 |
| 2015 | 3 | 0 |
| 2016 | 1 | 0 |
| 2017 | 0 | 0 |
| 2018 | 0 | 0 |
| 2019 | 0 | 0 |
| 2020 | 1 | 1 |
| 2021 | 0 | 0 |
| 2022 | 0 | 2 |
| 2023 | 2 | 1 |
| 2024 | 2 | 2 |
By publication year.
Recent patents
- Dual source injector with switchable analyzing magnet8 Oct 2024US 12,112,918 B2Axcelis Technologies, Inc.
- Electron beam application apparatus27 Feb 2024US 11,915,903 B2Hitachi High-Tech Corporation
- Dual source injector with switchable analyzing magnet21 Nov 2023US 11,823,858 B2Axcelis Technologies, Inc.
- Apparatus for multiple charged-particle beams31 Oct 2023US 11,804,355 B2ASML Netherlands B. V.
- Methods and systems for plasma deposition and treatment8 Dec 2020US 10,861,667 B2
- Techniques for electron energy loss spectroscopy at high energy17 Oct 2024US 2024/0347314 A1FEI Company
- Dual source injector with switchable analyzing magnet25 Jan 2024US 2024/0029998 A1Axcelis Technologies, Inc.
- Dual source injector with switchable analyzing magnet28 Sep 2023US 2023/0307210 A1Axcelis Technologies, Inc.
- Electron beam application apparatus6 Oct 2022US 2022/0319798 A1Hitachi High-Tech Corporation
- Apparatus for multiple charged-particle beams3 Mar 2022US 2022/0068587 A1ASML Netherlands B. V.
Most cited
By later US patents
- Prism array for electron beam inspection and defect review14US 6,878,937 B1KLA-Tencor Technologies Corporation · 2005
- Particle-optical arrangements and particle-optical systems5US 7,022,987 B2Carl Zeiss NIS GmbH · 2006
- Electron beam device4US 7,923,685 B2Hitachi, Ltd. · 2011
- Post-decel magnetic energy filter for ion implantation systems4US 8,124,946 B2Axcelis Technologies, Inc. · 2012
- Mirror pulse compressor for electron beam apparatus2US 9,406,479 B1Electron Optica, Inc. · 2016