H01J 2237/0653
Intensity
H01J2237/0653 (Intensity) appears on 44 US grants and 44 published applications in this corpus.
Search patents in H01J- Granted patents
- 44
- Published applications
- 44
- Assignees
- 25
- Inventors
- 79
- Latest grant
- 8 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2001 | 1 | 0 |
| 2002 | 0 | 0 |
| 2003 | 1 | 0 |
| 2004 | 0 | 1 |
| 2005 | 0 | 1 |
| 2006 | 1 | 2 |
| 2007 | 1 | 1 |
| 2008 | 3 | 0 |
| 2009 | 0 | 1 |
| 2010 | 0 | 0 |
| 2011 | 0 | 2 |
| 2012 | 2 | 1 |
| 2013 | 2 | 2 |
| 2014 | 3 | 2 |
| 2015 | 3 | 5 |
| 2016 | 3 | 4 |
| 2017 | 7 | 4 |
| 2018 | 1 | 3 |
| 2019 | 4 | 2 |
| 2020 | 1 | 1 |
| 2021 | 1 | 1 |
| 2022 | 1 | 2 |
| 2023 | 2 | 6 |
| 2024 | 1 | 3 |
| 2025 | 3 | 0 |
| 2026 | 3 | 0 |
By publication year. 2026 runs to 8 Oct.
Recent patents
- Spin-polarized scanning electron microscope8 Sep 2026US 12,731,760 B2Hitachi High-Tech Corporation
- Charged particle source28 Apr 2026US 12,614,691 B2ASML Netherlands B. V.
- Repeller for ion generating apparatus, ion generating apparatus and semiconductor wafer ion implantation apparatus21 Apr 2026US 12,609,263 B2Samsung Electronics Co., Ltd.
- Charged particle gun and charged particle beam system11 Nov 2025US 12,469,664 B2Hitachi High-Tech Corporation
- Electron gun and electron microscope24 Jun 2025US 12,340,969 B2KLA Corporation
- Repeller for ion generating apparatus, ion generating apparatus and semiconductor wafer ion implantation apparatus29 Aug 2024US 2024/0290570 A1Samsung Electronics Co., Ltd.
- Spin-polarized scanning electron microscope25 Jul 2024US 2024/0249911 A1Hitachi High-Tech Corporation
- Electron gun, electron beam applicator, and emission method of electron beam27 Jun 2024US 2024/0212967 A1Photo electron Soul Inc.
- Method and apparatus for usable beam current and brightness in schottky thermal field emission (tfe)21 Dec 2023US 2023/0411114 A1NuFlare Technology America, Inc.
- Electron gun and electron microscope21 Sep 2023US 2023/0298847 A1KLA Corporation
Most cited
By later US patents
- High-speed electron beam inspection58US 7,315,022 B1KLA-Tencor Technologies Corporation · 2008
- Suppression of emission noise for microcolumn applications in electron beam inspection10US 6,555,830 B1APPLIED Materials.Inc. · 2003
- Field-emission electron gun and method for controlling same6US 8,766,542 B2Hitachi High-Technologies Corporation · 2014
- Field emission gun and electron beam instruments5US 7,151,268 B2Hitachi High-Technologies Corporation · 2006
- Ion-implanting apparatus, ion-implanting method, and device manufactured thereby5US 7,365,346 B2Matsushita Electric Industrial Co., Ltd. · 2008