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AssigneeApplied Materials, Inc.
InventorsMarian Mankos, Tai-Hon Philip Chang, Kim Y. Lee, Ming Yu
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The microcolumn configuration of the present invention provides for emission noise reduction through the use of a screened beam-limiting aperture for monitoring the electron beam current. This novel approach utilizes a screening aperture located between the emitter and the beam-limiting aperture, which screening aperture collects most of the current transmitted by the first lens of the electron beam column. In order to achieve good noise suppression, the screening aperture should let through only the portion of the beam where the electrons are correlated. The current collected by the beam-limiting aperture is then used as a reference signal in the image processing. The elimination of this noise increases the detection sensitivity of an inspection tool. This reduces the total number of required pixels and therefore increases the throughput of the tool.
A method for generating an electron beam, comprising the steps of:
An inspection method using a field emission electron gun, comprising the steps of:
An apparatus for generating an electron beam, comprising:
An apparatus for inspecting a target using a field emission electron gun, comprising:
Dependencies are inferred from the claim text.