H01J 2237/06358
Secondary emission
H01J2237/06358 (Secondary emission) appears on 4 US grants and 6 published applications in this corpus.
Search patents in H01J- Granted patents
- 4
- Published applications
- 6
- Assignees
- 6
- Inventors
- 23
- Latest grant
- 10 Dec 2024
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2004 | 1 | 1 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 1 |
| 2010 | 1 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 0 |
| 2014 | 1 | 0 |
| 2015 | 0 | 1 |
| 2016 | 0 | 0 |
| 2017 | 0 | 0 |
| 2018 | 0 | 0 |
| 2019 | 0 | 0 |
| 2020 | 0 | 1 |
| 2021 | 0 | 0 |
| 2022 | 0 | 1 |
| 2023 | 0 | 0 |
| 2024 | 1 | 0 |
| 2025 | 0 | 1 |
By publication year.
Recent patents
- Electrode for plasma processing apparatus and plasma processing apparatus10 Dec 2024US 12,165,850 B2Tokyo Electron Limited
- Cold electron number amplifier10 Jun 2014US 8,750,458 B1Moxtek, Inc.
- Electron beam irradiation device9 Nov 2010US 7,829,863 B2Kyoto University
- Electron projection lithography apparatus using secondary electrons31 Aug 2004US 6,784,438 B2Samsung Electronics Co., Ltd.
- Laser system and method for generating secondary radiation through interaction of a primary laser beam with a target material27 Nov 2025US 2025/0364767 A1Trumpf Laser GmbH
- Electrode for plasma processing apparatus and plasma processing apparatus27 Oct 2022US 2022/0344127 A1Tokyo Electron Limited
- Method and apparatus for angled etching8 Oct 2020US 2020/0321186 A1
- Electron source and X-ray fluorescence analyser using an electron source5 Mar 2015US 2015/0060663 A1Fenno-Aurum Oy
- Electron Beam Irradiation Device21 May 2009US 2009/0127473 A1Kyoto University
Most cited
By later US patents