Electron beam irradiation device

An electron beam irradiation device, comprising:

• a light pattern generating section for generating a two-dimensional light pattern;
• an electron amplification section for (i) generating an electron beam array based on the light pattern entered, (ii) amplifying the electron beam array, and (iii) emitting the electron beam array as an amplified electron beam array;
• and
• an electron beam lens section for converging the amplified electron beam array on an electron ray resist, wherein:
• said electron amplification section includes multiple cylindrical microchannels which are arranged adjacent to one another in a direction perpendicularly crossing a direction of a light axis of the light pattern so that respective axes of the microchannels are parallel to the direction of the light axis, and
• each of said microchannels has such a shape that its inner peripheral surface of an end portion, on an emission side of the amplified electron beam array, is gradually spread outwardly towards an emission end of the microchannel, for a purpose of restraining divergence in emission angle of the amplified electron beam array from the electron amplification section.