H01J 2237/0456
Supports
H01J2237/0456 (Supports) appears on 133 US grants and 155 published applications in this corpus.
Search patents in H01J- Granted patents
- 133
- Published applications
- 155
- Assignees
- 67
- Inventors
- 355
- Latest grant
- 2 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 2 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 3 | 0 |
| 2000 | 2 | 0 |
| 2001 | 0 | 2 |
| 2002 | 1 | 4 |
| 2003 | 3 | 1 |
| 2004 | 3 | 2 |
| 2005 | 1 | 1 |
| 2006 | 0 | 8 |
| 2007 | 2 | 8 |
| 2008 | 9 | 8 |
| 2009 | 8 | 9 |
| 2010 | 5 | 8 |
| 2011 | 7 | 9 |
| 2012 | 6 | 5 |
| 2013 | 9 | 4 |
| 2014 | 6 | 5 |
| 2015 | 3 | 1 |
| 2016 | 2 | 6 |
| 2017 | 3 | 2 |
| 2018 | 2 | 6 |
| 2019 | 4 | 5 |
| 2020 | 5 | 11 |
| 2021 | 10 | 12 |
| 2022 | 8 | 7 |
| 2023 | 6 | 12 |
| 2024 | 6 | 10 |
| 2025 | 7 | 6 |
| 2026 | 5 | 3 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Focused ion beam system2 Jun 2026US 12,646,680 B2V Technology Co., Ltd.
- Wire or rod shaped extraction electrode optics12 May 2026US 12,626,885 B2Axcelis Technologies, Inc.
- Multi-beam pattern definition device28 Apr 2026US 12,614,695 B2IMS Nanofabrication GmbH
- Apparatus for analyzing and/or processing a sample with a particle beam and method24 Mar 2026US 12,586,755 B2Carl Zeiss SMT GmbH
- Multi-beam charged particle column24 Feb 2026US 12,562,334 B2ASML Netherlands B. V.
- Ion Beam Adjustment Method and Ion Beam Device23 Jul 2026US 2026/0213116 A1Hitachi High-Tech Corporation
- Ion beam source apparatus, ion beam processing system, and ion beam processing method28 May 2026US 2026/0148922 A1Samsung Electronics Co., Ltd.
- Multi-beam charged particle microscope for inspection with improved image contrast23 Apr 2026US 2026/0112572 A1
- Charged particle beam device11 Sep 2025US 2025/0285827 A1Hitachi High-Tech Science Corporation
- Multi-beam charged particle microscope design with anisotropic filtering for improved image contrast24 Jul 2025US 2025/0239429 A1
Most cited
By later US patents
- Ion source47US 7,767,977 B1Varian Semiconductor Equipment Associates, Inc. · 2010
- Pattern definition device with multiple multibeam array43US 8,546,767 B2IMS Nanofabrication GmbH · 2013
- Particle-optical systems and arrangements and particle-optical components for such systems and arrangements35US 9,653,254 B2Applied Materials Israel Ltd. · 2017
- Multi-beam charged particle system34US 10,741,355 B1Carl Zeiss MultiSEM GmbH · 2020
- Hybrid focused-flood ion beam system and method31US 4,687,940 AHughes Aircraft Company · 1987