H01J 2237/0042
Deflection of neutralising particles
H01J2237/0042 (Deflection of neutralising particles) appears on 24 US grants and 18 published applications in this corpus.
Search patents in H01J- Granted patents
- 24
- Published applications
- 18
- Assignees
- 18
- Inventors
- 50
- Latest grant
- 20 Jun 2023
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 2 | 0 |
| 2001 | 1 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 1 |
| 2005 | 1 | 1 |
| 2006 | 0 | 4 |
| 2007 | 1 | 1 |
| 2008 | 3 | 2 |
| 2009 | 2 | 2 |
| 2010 | 2 | 1 |
| 2011 | 2 | 1 |
| 2012 | 0 | 0 |
| 2013 | 1 | 0 |
| 2014 | 3 | 1 |
| 2015 | 1 | 0 |
| 2016 | 0 | 0 |
| 2017 | 0 | 0 |
| 2018 | 1 | 2 |
| 2019 | 0 | 1 |
| 2020 | 1 | 0 |
| 2021 | 1 | 1 |
| 2022 | 0 | 0 |
| 2023 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Particle beam apparatus and composite beam apparatus20 Jun 2023US 11,682,536 B2Hitachi High-Tech Science Corporation
- Method and apparatus for neutral beam processing based on gas cluster ion beam technology14 Dec 2021US 11,199,769 B2
- Apparatus and techniques for decelerated ion beam with no energy contamination23 Jun 2020US 10,692,697 B2Varian Semiconductor Equipment Associates, Inc.
- Apparatus and techniques for decelerated ion beam with no energy contamination4 Dec 2018US 10,147,584 B2Varian Semiconductor Equipment Associates, Inc.
- Electromagnetic electron reflector15 Dec 2015US 9,214,318 B1International Business Machines Corporation
- Particle beam apparatus and composite beam apparatus23 Sep 2021US 2021/0296079 A1Hitachi High-Tech Science Corporation
- Apparatus and techniques for decelerated ion beam with no energy contamination14 Feb 2019US 2019/0051493 A1Varian Semiconductor Equipment Associates, Inc.
- Method and apparatus for neutral beam processing based on gas cluster ion beam technology18 Oct 2018US 2018/0299771 A1Exogenesis Corporation
- Apparatus and techniques for decelerated ion beam with no energy contamination20 Sep 2018US 2018/0269033 A1Varian Semiconductor Equipment Associates, Inc.
- Ion implantation apparatus27 Feb 2014US 2014/0053778 A1Nissin Ion Equipment Co., Ltd.
Most cited
By later US patents
- Ion implantation with charge neutralization72US 6,271,529 B1Ebara Corporation · 2001
- Process for analysis of a sample34US 6,078,045 AAtomika Instruments GmbH · 2000
- Ion implanter and controlling method therefor15US 5,293,508 AMitsubishi Denki Kabushiki Kaisha · 1994
- Dual beam system14US 7,161,159 B2FEI Company · 2007
- Aberration-corrected and energy-filtered low energy electron microscope with monochromatic dual beam illumination9US 8,729,466 B1Electron Optica, Inc. · 2014