G03F 7/031
Organic compounds not covered by group g03f7/029
Official title: Organic compounds not covered by group G03F7/029
G03F7/031 (Organic compounds not covered by group g03f7/029) appears on 1,138 US grants and 1,175 published applications in this corpus.
Search patents in G03F- Granted patents
- 1,138
- Published applications
- 1,175
- Assignees
- 400
- Inventors
- 2,650
- Latest grant
- 1 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 12 | 0 |
| 1977 | 24 | 0 |
| 1978 | 10 | 0 |
| 1979 | 11 | 0 |
| 1980 | 8 | 0 |
| 1981 | 26 | 0 |
| 1982 | 12 | 0 |
| 1983 | 15 | 0 |
| 1984 | 17 | 0 |
| 1985 | 18 | 0 |
| 1986 | 16 | 0 |
| 1987 | 13 | 0 |
| 1988 | 14 | 0 |
| 1989 | 12 | 0 |
| 1990 | 29 | 0 |
| 1991 | 25 | 0 |
| 1992 | 19 | 0 |
| 1993 | 18 | 0 |
| 1994 | 12 | 0 |
| 1995 | 10 | 0 |
| 1996 | 18 | 0 |
| 1997 | 21 | 0 |
| 1998 | 21 | 0 |
| 1999 | 18 | 0 |
| 2000 | 27 | 0 |
| 2001 | 9 | 5 |
| 2002 | 14 | 16 |
| 2003 | 13 | 22 |
| 2004 | 20 | 38 |
| 2005 | 10 | 35 |
| 2006 | 19 | 53 |
| 2007 | 27 | 40 |
| 2008 | 19 | 40 |
| 2009 | 19 | 33 |
| 2010 | 23 | 48 |
| 2011 | 13 | 36 |
| 2012 | 29 | 31 |
| 2013 | 30 | 35 |
| 2014 | 38 | 39 |
| 2015 | 33 | 37 |
| 2016 | 26 | 53 |
| 2017 | 37 | 79 |
| 2018 | 35 | 86 |
| 2019 | 65 | 56 |
| 2020 | 52 | 76 |
| 2021 | 40 | 46 |
| 2022 | 33 | 58 |
| 2023 | 27 | 53 |
| 2024 | 36 | 65 |
| 2025 | 25 | 56 |
| 2026 | 20 | 39 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Semiconductor photoresist compositions and methods of forming patterns using the composition1 Sep 2026US 12,724,342 B2Samsung SDI.Co., Ltd.
- Photocurable composition25 Aug 2026US 12,715,942 B2Canon Kabushiki Kaisha
- Methods of forming an object in a volume of a photohardenable composition, photohardenable compositions, and photoinitiators25 Aug 2026US 12,715,998 B2Quadratic 3D, Inc.
- Casting lacquer for screen printing25 Aug 2026US 12,716,002 B2BASF SE
- Photosensitive composition25 Aug 2026US 12,717,234 B2Xsys Germany GmbH
- Photoresist film1 Oct 2026US 2026/0299413 A1Dupont Electronics, Inc.
- Photosensitive resin composition, patterned cured product, production method for patterned cured product, and electric component24 Sep 2026US 2026/0293662 A1
- Compound, composition, cured product, optically anisotropic body, optical element, and light guiding element10 Sep 2026US 2026/0267056 A1FUJIFILM Corporation
- Use of specific photoinitiators in a photopolymerization process using combined led light wavelengths3 Sep 2026US 2026/0258164 A1Igm Resins Italia S.R.L.
- Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for producing circuit board27 Aug 2026US 2026/0251971 A1
Most cited
By later US patents
- Ternary photoinitiator system for addition polymerization289US 5,545,676 AMinnesota Mining and Manufacturing Company · 1996
- Oxime ester photoiniators having a combined structure283US 7,189,489 B2Ciba Specialty Chemicals Corporation · 2007
- Oxime ester photoinitiators263US 7,759,043 B2Ciba Specialty Chemicals Corporation · 2010
- Switchable volume hologram materials and devices234US 5,942,157 AScience Applications International Corporation · 1999
- Sensitizers for photopolymerization190US 4,308,400 ACiba-Geigy Corporation · 1981