G01Q 40/02
Calibration standards and methods of fabrication thereof
G01Q40/02 (Calibration standards and methods of fabrication thereof) appears on 65 US grants and 58 published applications in this corpus.
Search patents in G01Q- Granted patents
- 65
- Published applications
- 58
- Assignees
- 57
- Inventors
- 189
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 2 | 0 |
| 1995 | 0 | 0 |
| 1996 | 3 | 0 |
| 1997 | 5 | 0 |
| 1998 | 0 | 0 |
| 1999 | 2 | 0 |
| 2000 | 2 | 0 |
| 2001 | 2 | 1 |
| 2002 | 4 | 2 |
| 2003 | 2 | 3 |
| 2004 | 1 | 1 |
| 2005 | 2 | 1 |
| 2006 | 3 | 7 |
| 2007 | 2 | 3 |
| 2008 | 2 | 3 |
| 2009 | 2 | 3 |
| 2010 | 0 | 3 |
| 2011 | 2 | 2 |
| 2012 | 0 | 2 |
| 2013 | 3 | 1 |
| 2014 | 2 | 1 |
| 2015 | 1 | 1 |
| 2016 | 1 | 2 |
| 2017 | 1 | 0 |
| 2018 | 1 | 2 |
| 2019 | 2 | 3 |
| 2020 | 4 | 3 |
| 2021 | 0 | 1 |
| 2022 | 3 | 3 |
| 2023 | 4 | 2 |
| 2024 | 0 | 7 |
| 2025 | 2 | 1 |
| 2026 | 4 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method of removing defect of mask15 Sep 2026US 12,736,870 B2Samsung Electronics Co., Ltd.
- Probe assessment method and SPM28 Apr 2026US 12,613,257 B2Shimadzu Corporation
- Reference sample suitable to calibrate magnetic microscope's probe tip and calibration method31 Mar 2026US 12,590,988 B1China Jiliang University
- Automated landing method of a scanning probe microscopy system and scanning probe microscopy system using the same10 Feb 2026US 12,546,800 B2Nearfield Instruments B.V.
- Standard sample and manufacturing method thereof23 Sep 2025US 12,422,453 B2NTT Advanced Technology Corporation
- Method of inspecting tip of atomic force microscope and method of manufacturing semiconductor device6 Nov 2025US 2025/0341540 A1Korea Advanced Institute of Science and Technology
- Method and apparatus for scanning a sample with a probe26 Dec 2024US 2024/0426869 A1Infinitesima Limited
- System for performing atomic force microscopy, including a grid plate qualification tool18 Jul 2024US 2024/0241151 A1Nearfield Instruments B.V.
- Method of removing defect of mask4 Jul 2024US 2024/0219826 A1Samsung Electronics Co., Ltd.
- Method of calibrating in a scanning probe microscopy system an optical microscope, calibration structure and scanning probe microscopy device27 Jun 2024US 2024/0210442 A1Nearfield Instruments B.V.
Most cited
By later US patents
- Wafer metrology pattern integrating both overlay and critical dimension features for SEM or AFM measurements98US 5,701,013 AMosel Viltelic, Inc. · 1997
- Composite scanning tunnelling microscope with a positioning function54US 5,117,110 ASeiko Instruments Inc. · 1992
- Method of detecting positional displacement between mask and wafer, and exposure apparatus adopting the method41US 5,508,527 ACanon Kabushiki Kaisha · 1996
- Calibration standards for profilometers and methods of producing them34US 5,578,745 AInternational Business Machines Corporation · 1996
- Use of carbon nanotubes to calibrate conventional tips used in AFM29US 6,354,133 B1Advanced Micro Devices, Inc. · 2002