C23C 14/0078
By moving the substrates between spatially separate sputtering and reaction stations
Official title: {by moving the substrates between spatially separate sputtering and reaction stations}
C23C14/0078 (By moving the substrates between spatially separate sputtering and reaction stations) appears on 58 US grants and 72 published applications in this corpus.
Search patents in C23C- Granted patents
- 58
- Published applications
- 72
- Assignees
- 44
- Inventors
- 227
- Latest grant
- 30 Sep 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 2 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 6 | 0 |
| 1998 | 3 | 0 |
| 1999 | 1 | 0 |
| 2000 | 3 | 0 |
| 2001 | 3 | 2 |
| 2002 | 3 | 1 |
| 2003 | 1 | 0 |
| 2004 | 0 | 3 |
| 2005 | 0 | 4 |
| 2006 | 0 | 8 |
| 2007 | 0 | 1 |
| 2008 | 2 | 3 |
| 2009 | 0 | 2 |
| 2010 | 3 | 2 |
| 2011 | 1 | 5 |
| 2012 | 1 | 2 |
| 2013 | 1 | 1 |
| 2014 | 2 | 6 |
| 2015 | 2 | 2 |
| 2016 | 3 | 2 |
| 2017 | 1 | 4 |
| 2018 | 0 | 3 |
| 2019 | 3 | 5 |
| 2020 | 2 | 3 |
| 2021 | 3 | 5 |
| 2022 | 0 | 0 |
| 2023 | 4 | 2 |
| 2024 | 2 | 1 |
| 2025 | 3 | 3 |
| 2026 | 0 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Film forming apparatus and film forming method30 Sep 2025US 12,428,721 B2Tokyo Electron Limited
- Film forming apparatus22 Jul 2025US 12,365,976 B2Shibaura Mechatronics Corporation
- Method and device for producing uniform films on moving substrates and films produced in this way4 Feb 2025US 12,217,947 B2Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V.
- Deposition system with integrated cooling on a rotating drum6 Aug 2024US 12,057,297 B2
- Apparatus and methods for depositing variable interference filters6 Feb 2024US 11,891,686 B2
- Process to deposit quantized nano layers by magnetron sputtering15 Jan 2026US 2026/0015711 A1
- Film formation apparatus and film formation method of gallium nitride film1 Jan 2026US 2026/0002250 A1Japan Display Inc.
- System and method for application of electro-optical film stacks on substrates without breaking vacuum4 Dec 2025US 2025/0369095 A1Corning Incorporated
- Metal-fluoride thin films and deposition methods27 Nov 2025US 2025/0361606 A1
- Optical filter, method of manufacturing optical filter, optical filter unit, method of manufacturing optical filter unit, and optical measurement apparatus28 Aug 2025US 2025/0271604 A1Konica Minolta, Inc.
Most cited
By later US patents
- Magnetron sputtering apparatus and process326US 4,851,095 AOptical Coating Laboratory, Inc. · 1989
- Process for depositing optical thin films on both planar and non-planar substrates96US 5,798,027 AOptical Coating Laboratory, Inc. · 1998
- Geometries and configurations for magnetron sputtering apparatus78US 5,618,388 AOptical Coating Laboratory, Inc. · 1997
- Self-healing UV-barrier coating for flexible polymer substrate68US 5,790,304 AOptical Coating Laboratory, Inc. · 1998
- Method for forming a thin film of a metal compound by vacuum deposition68US 6,103,320 AShincron Co., Ltd. · 2000