Film forming apparatus

A film forming apparatus comprising:

• a chamber having an interior capable of being evacuated;
• a rotary table provided in the chamber and configured to rotate to circulate and transfer a workpiece along a circumferential transfer path;
• a plurality of processing units configured to perform plasma processing on the workpiece transferred by the rotary table by plasmarizing a reaction gas introduced into the processing units;
• an inner wall provided in at least one of the processing units to define a processing space, into which the reaction gas is introduced to perform the plasma processing in the processing space, and having an opening facing the rotary table in a non-contact manner;
• an outer wall configured to cover a periphery of the inner wall with a gap interposed between the inner wall and the outer wall, and configured to form an opening facing the rotary table in a non-contact manner and an exhaust space that is closed on a side opposite to the opening in the outer wall;
• and
• an exhaust port in communication with the exhaust space and connected to an exhaust device configured to suction the reaction gas leaking from a gap between the opening in the inner wall and the rotary table and exhaust the reaction gas to an outside of the chamber,
• wherein one or more of the processing units is at least one film forming part configured to form a film by depositing a film formation material on the workpiece by sputtering, and
• wherein both ends of the outer wall are in contact with a side surface of the chamber, and a portion of an outer periphery of the inner wall and the side surface of the chamber are partitioned, so that the exhaust space has opposite ends via which the reaction gas does not circulate.