C08F 222/18
Esters containing halogen
C08F222/18 (Esters containing halogen) appears on 36 US grants and 40 published applications in this corpus.
Search patents in C08F- Granted patents
- 36
- Published applications
- 40
- Assignees
- 25
- Inventors
- 105
- Latest grant
- 13 Jan 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 2 | 0 |
| 2002 | 1 | 3 |
| 2003 | 0 | 1 |
| 2004 | 1 | 0 |
| 2005 | 1 | 1 |
| 2006 | 2 | 4 |
| 2007 | 1 | 0 |
| 2008 | 3 | 1 |
| 2009 | 1 | 1 |
| 2010 | 0 | 0 |
| 2011 | 0 | 1 |
| 2012 | 0 | 1 |
| 2013 | 0 | 2 |
| 2014 | 3 | 2 |
| 2015 | 2 | 2 |
| 2016 | 3 | 5 |
| 2017 | 1 | 1 |
| 2018 | 3 | 2 |
| 2019 | 0 | 3 |
| 2020 | 3 | 3 |
| 2021 | 3 | 0 |
| 2022 | 1 | 1 |
| 2023 | 1 | 1 |
| 2024 | 0 | 1 |
| 2025 | 1 | 1 |
| 2026 | 1 | 3 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Amphiphilic copolymer with zwitterionic and fluorinated moieties13 Jan 2026US 12,522,683 B2Cornell University
- Method for the preparation of photoaligning polymer materials and compositions21 Oct 2025US 12,448,473 B2Rolic Technologies AG
- Resist composition and method of forming resist pattern5 Sep 2023US 11,747,726 B2Tokyo Ohka Kogyo.Co., Ltd.
- Resin, resist composition and method for producing resist pattern1 Mar 2022US 11,261,273 B2Sumitomo Chemical Company, Limited
- Resist composition, method of forming resist pattern, polymeric compound, and compound13 Jul 2021US 11,061,329 B2Tokyo Ohka Kogyo.Co., Ltd.
- Copolymer, positive resist composition, and method of forming resist pattern13 Aug 2026US 2026/0235952 A1Zeon Corporation
- Polymerizable compound and use thereof2 Apr 2026US 2026/0092214 A1Beijing Bayi Space Lcd Technology Co., Ltd
- Method for the preparation of photoaligning polymer materials and compositions8 Jan 2026US 2026/0008878 A1Rolic Technologies AG
- Polymer, resist composition comprising the same and method of forming pattern using the same17 Apr 2025US 2025/0123563 A1Samsung Electronics Co., Ltd.
- Photo-curable composition, cured product thereof, and display device comprising same21 Mar 2024US 2024/0092951 A1Dongjin Semichem Co., Ltd.
Most cited
By later US patents
- Ceramer composition and composite comprising free radically curable fluorochemical component93US 6,238,798 B13M Innovative Properties Company · 2001
- Ceramer composition and composite comprising free radically curable fluorochemical component45US 6,497,961 B23M Innovative Properties Company · 2002
- High strength polymeric networks derived from (meth) acrylate resins with organofluorine content and process for preparing same27US 6,184,339 B2The United States of America as represented by the Secretary of Commerce · 2001
- Fluorinated photopolymer composition and waveguide device17US 6,929,899 B2E. I. Du Pont de Nemours and Company · 2005
- Cross-linkable fluorinated photopolymer11US 9,541,829 B2Orthogonal, Inc. · 2017