Fluorinated photopolymer composition and waveguide device
AssigneeE. I. Du Pont de Nemours and Company
InventorsIndira S. Pottebaum, Chuck C. Xu, Chris E. Osuch, Deepti Pant, Louay A. Eldada
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Abstract
A photosensitive composition having low absorption loss at 1,300-1,610 nm and is suitable for practical waveguide devices. The composition comprises at least one (meth)acrylate prepared from a fluorinated monomer or polymer having minimum two hydroxyl groups, at least one multifunctional non-fluorinated (meth)acrylate and at least one photoinitiator. An optical coating on a variety of substrates is obtained by exposing the photosensitive composition to actinic radiation such as UV light. An optical waveguide device is fabricated by patterning the photosensitive composition on a substrate.
Claims7
A composition comprising,
- a) at least one fluorinated (meth)acrylate prepared from a fluorinated monomer or polymer having at least two hydroxyl groups per molecule;
- b) at least one non-fluorinated (meth)acrylate, said at least one non-fluorinated (meth)acrylate being soluble in said fluorinated (meth)acrylate, said non-fluorinated (meth)acrylate having at least two (meth)acrylate groups per molecule;
- and
- c) at least one photoinitiator, said photoinitiator being soluble in the fluorinated (meth)acrylate;
- wherein said at least one fluorinated (meth)acrylate is prepared from an ethoxylated fluoropolymer having the following formula:
- Rf—(—O—(—CH2—CH2—O)m—H)n
- wherein Rf is a fluorinated moiety having a F/H ratio of at least 3:1, m=1-10, and n=2-6.
Dependencies are inferred from the claim text.