C08F 222/185
The ester chains containing seven or more carbon atoms
Official title: {the ester chains containing seven or more carbon atoms}
C08F222/185 (The ester chains containing seven or more carbon atoms) appears on 15 US grants and 15 published applications in this corpus.
Search patents in C08F- Granted patents
- 15
- Published applications
- 15
- Assignees
- 12
- Inventors
- 37
- Latest grant
- 21 Oct 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2001 | 1 | 0 |
| 2002 | 1 | 1 |
| 2003 | 0 | 1 |
| 2004 | 1 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 1 |
| 2007 | 0 | 0 |
| 2008 | 1 | 1 |
| 2009 | 1 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 0 |
| 2014 | 0 | 0 |
| 2015 | 0 | 2 |
| 2016 | 2 | 4 |
| 2017 | 1 | 0 |
| 2018 | 3 | 1 |
| 2019 | 0 | 2 |
| 2020 | 0 | 1 |
| 2021 | 3 | 0 |
| 2022 | 0 | 0 |
| 2023 | 0 | 0 |
| 2024 | 0 | 0 |
| 2025 | 1 | 0 |
| 2026 | 0 | 1 |
By publication year. 2026 runs to 8 Oct.
Recent patents
- Method for the preparation of photoaligning polymer materials and compositions21 Oct 2025US 12,448,473 B2Rolic Technologies AG
- Resist composition, method of forming resist pattern, polymeric compound, and compound13 Jul 2021US 11,061,329 B2Tokyo Ohka Kogyo.Co., Ltd.
- Anti-reflective film and preparation method of the same29 Jun 2021US 11,046,827 B2LG Chem.Ltd.
- Fluoromonomer and fluorooligomer compounds, photopolymerizable composition, and hydrophobic film using the same4 May 2021US 10,995,215 B2Ewha University-Industry Collaboration Foundation
- Resin, resist composition and method for producing resist pattern12 Jun 2018US 9,996,002 B2Sumitomo Chemical Company, Limited
- Method for the preparation of photoaligning polymer materials and compositions8 Jan 2026US 2026/0008878 A1Rolic Technologies AG
- Method for the preparation of photoaligning polymer materials and compositions14 May 2020US 2020/0148802 A1Rolic Technologies AG
- Resist composition, method of forming resist pattern, polymeric compound, and compound30 May 2019US 2019/0163057 A1Tokyo Ohka Kogyo.Co., Ltd.
- Fluoromonomer and fluorooligomer compounds, photopolymerizable composition, and hydrophobic film using the same17 Jan 2019US 2019/0016887 A1Ewha University-Industry Collaboration Foundation
- Anti-reflective film and preparation method of the same16 Aug 2018US 2018/0231690 A1LG Chem.Ltd.
Most cited
By later US patents
- Ceramer composition and composite comprising free radically curable fluorochemical component93US 6,238,798 B13M Innovative Properties Company · 2001
- Ceramer composition and composite comprising free radically curable fluorochemical component45US 6,497,961 B23M Innovative Properties Company · 2002
- Cross-linkable fluorinated photopolymer11US 9,541,829 B2Orthogonal, Inc. · 2017
- Polymerizable composition showing liquid-crystal phase and optically anisotropic object made with the same9US 6,730,241 B2Dainippon Ink and Chemicals, Inc. · 2004
- Low shrinkage, low optical absorbance, low refractive index adhesive composition3US 7,625,984 B2Enablence Technologies USA Inc. · 2009