Resist composition, method of forming resist pattern, polymeric compound, and compound
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsTakuya IKEDA, Masatoshi ARAI
Life of this patent
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Abstract
A resist composition including a resin component having a structural unit derived form a compound represented by formula (a0-1) (in the formula, W represents a polymerizable group-containing group; Ra01 is a group which is bonded to Ra03 to form an aliphatic cyclic group, or bonded to Ra04 to form an aliphatic cyclic group; Ra02 represents a hydrocarbon group which may have a substituent; Ra03 is a hydrogen atom or a monovalent organic group in the case where Ra01 is not bonded thereto; Ra04 is a hydrogen atom or a monovalent organic group in the case where Ra01 is not bonded thereto; and Ra05 to Ra07 each independently represents a hydrogen atom or a monovalent organic group).
Claims7
A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition comprising a resin component (A1) which exhibits changed solubility in a developing solution under action of acid, the resin component (A1) comprising a structural unit (a0) derived from a compound represented by general formula (a0-1) shown below:
- wherein W represents a polymerizable group-containing group;
- Ra01 is a group which is bonded to Ra03 to form an aliphatic cyclic group together with the carbon atom to which Ra03 is bonded and the carbon atom to which Ra01 is bonded, or a group which is bonded to Ra04 to form an aliphatic cyclic group together with the carbon atom to which Ra04 is bonded, the carbon atom to which Ra03 is bonded and the carbon atom to which Ra01 is bonded;
- Ra02 represents a hydrocarbon group which may have a substituent;
- Ra03 is a hydrogen atom or a monovalent organic group in the case where Ra01 is not bonded thereto;
- Ra04 is a hydrogen atom or a monovalent organic group in the case where Ra01 is not bonded thereto;
- and Ra05 to Ra07 each independently represents a hydrogen atom or a monovalent organic group.
A polymeric compound comprising a structural unit (a0) derived from a compound represented by general formula (a0-1) shown below:
- wherein W represents a polymerizable group-containing group;
- Ra01 is a group which is bonded to Ra03 to form an aliphatic cyclic group together with the carbon atom to which Ra03 is bonded and the carbon atom to which Ra01 is bonded, or a group which is bonded to Ra04 to form an aliphatic cyclic group together with the carbon atom to which Ra04 is bonded, the carbon atom to which Ra03 is bonded and the carbon atom to which Ra01 is bonded;
- Ra02 represents a hydrocarbon group which may have a substituent;
- Ra03 is a hydrogen atom or a monovalent organic group in the case where Ra01 is not bonded thereto;
- Ra04 is a hydrogen atom or a monovalent organic group in the case where Ra01 is not bonded thereto;
- and Ra05 to Ra07 each independently represents a hydrogen atom or a monovalent organic group.
A compound represented by general formula (a0-1) shown below:
- In the formula, W represents a polymerizable group-containing group;
- Ra01 is a group which is bonded to Ra03 to form an aliphatic cyclic group together with the carbon atom to which Ra03 is bonded and the carbon atom to which Ra01 is bonded, or a group which is bonded to Ra04 to form an aliphatic cyclic group together with the carbon atom to which Ra04 is bonded, the carbon atom to which Ra03 is bonded and the carbon atom to which Ra01 is bonded;
- Ra02 represents a hydrocarbon group which may have a substituent;
- Ra03 is a hydrogen atom or a monovalent organic group in the case where Ra01 is not bonded thereto;
- Ra04 is a hydrogen atom or a monovalent organic group in the case where Ra01 is not bonded thereto;
- and Ra05 to Ra07 each independently represents a hydrogen atom or a monovalent organic group.
Dependencies are inferred from the claim text.