Resin, resist composition and method for producing resist pattern
AssigneeSumitomo Chemical Company, Limited
InventorsTakashi Nishimura, Shota Nakano, Koji Ichikawa
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AssigneeSumitomo Chemical Company, Limited
InventorsTakashi Nishimura, Shota Nakano, Koji Ichikawa
Estimating the term…
A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), a structural unit having a cyclic carbonate and a structural unit represented by formula (I), the resin has no acid-labile group; (A2) a resin which has an acid-labile group; and an acid generator: wherein R3 represents a hydrogen atom or a methyl group, R4 represents a C1 to C24 saturated hydrocarbon group having a fluorine atom, and a methylene group contained in the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group, R1 represents a hydrogen atom or a methyl group, and L1 represents a single bond or a C1 to C18 divalent saturated hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group, and R2 represents a C3 to C18 alicyclic hydrocarbon group where a hydrogen atom may be replaced by a C1 to C8 aliphatic hydrocarbon group or a hydroxy group, provided that the carbon atom directly bonded to L1 has no aliphatic hydrocarbon group by which a hydrogen atom has been replaced.
A resist composition comprising
A resin consisting of:
Dependencies are inferred from the claim text.