Resin, resist composition and method for producing resist pattern
AssigneeSumitomo Chemical Company, Limited
InventorsTatsuro Masuyama, Satoshi Yamaguchi, Koji Ichikawa
Life of this patent
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Abstract
Disclosed is a resin comprising a structural unit derived from a compound represented by formula (I′) and a structural unit having an acid-labile group: wherein R1 and R2 each independently represent an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom, Ar represents an aromatic hydrocarbon group which may have a substituent, L1 represents a group represented by formula (X1-1), etc., L11, L13, L15 and L17 each independently represent an alkanediyl group, L12, L14, L16 and L18 each independently represent —O—, —CO—, —CO—O—, —O—CO— or —O—CO—O—, and * and ** are bonds, and ** represents a bond to an iodine atom.
Claims12
A resin comprising a structural unit derived from a compound represented by formula (I′):
- wherein, in formula (I′),
- R1 and R2 each independently represent an alkyl group having 1 to 6 carbon atoms which may have a halogen atom, a hydrogen atom or a halogen atom,
- Ar represents an aromatic hydrocarbon group having 6 to 24 carbon atoms which may have a substituent, and
- L1 and L2 each independently represent a group represented by any one of formula (X1-1) to formula (X1-8):
- wherein, in formula (X1-5) to formula (X1-8),
- L11, L13, L15 and L17 each independently represent an alkanediyl group having 1 to 6 carbon atoms,
- L12, L14, L16 and L18 each independently represent —O—, —CO—, —CO—O—, —O—CO— or —O—CO—O—, and
- * and ** are bonds, and ** represents a bond to an iodine atom.
Dependencies are inferred from the claim text.