C08F 220/1809
C9-acrylate
Official title: {C9-(meth)acrylate}
C08F220/1809 (C9-acrylate) appears on 105 US grants and 170 published applications in this corpus.
Search patents in C08F- Granted patents
- 105
- Published applications
- 170
- Assignees
- 33
- Inventors
- 319
- Latest grant
- 7 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 2 | 0 |
| 1993 | 0 | 0 |
| 1994 | 2 | 0 |
| 1995 | 3 | 0 |
| 1996 | 0 | 0 |
| 1997 | 2 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 1 |
| 2002 | 0 | 2 |
| 2003 | 1 | 0 |
| 2004 | 1 | 0 |
| 2005 | 0 | 2 |
| 2006 | 1 | 0 |
| 2007 | 1 | 1 |
| 2008 | 0 | 0 |
| 2009 | 0 | 1 |
| 2010 | 0 | 3 |
| 2011 | 1 | 3 |
| 2012 | 2 | 8 |
| 2013 | 1 | 3 |
| 2014 | 3 | 7 |
| 2015 | 3 | 6 |
| 2016 | 8 | 10 |
| 2017 | 9 | 15 |
| 2018 | 9 | 13 |
| 2019 | 6 | 10 |
| 2020 | 5 | 10 |
| 2021 | 5 | 15 |
| 2022 | 10 | 17 |
| 2023 | 12 | 19 |
| 2024 | 4 | 12 |
| 2025 | 7 | 6 |
| 2026 | 4 | 6 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Polymer, photoresist compositions including the same, and pattern formation methods7 Jul 2026US 12,675,045 B2Dupont Electronic Materials International, LLC
- Resist composition and patterning process16 Jun 2026US 12,656,683 B2Shin-Etsu Chemical Co., Ltd.
- Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device2 Jun 2026US 12,645,140 B2FUJIFILM Corporation
- Positive resist composition and pattern forming process17 Feb 2026US 12,554,197 B2Shin-Etsu Chemical Co., Ltd.
- Bio-electrode composition, bio-electrode, method for manufacturing bio-electrode, and reaction composite28 Oct 2025US 12,453,501 B2Shin-Etsu Chemical Co., Ltd.
- Radiation-sensitive composition, resist pattern formation method, polymer, and compound17 Sep 2026US 2026/0277103 A1Jsr Corporation
- Radiation-sensitive composition, method for forming pattern, polymer, and compound3 Sep 2026US 2026/0259498 A1Jsr Corporation
- Radiation-sensitive composition and method for forming resist pattern30 Jul 2026US 2026/0219577 A1Jsr Corporation
- Coating composition comprising a binder polymer obtainable by copolymerizing a monomer mixture comprising a vinyl monomer and a butenolide monomer23 Jul 2026US 2026/0209543 A1Akzo Nobel Coatings International B. V.
- Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for producing electronic device9 Jul 2026US 2026/0194813 A1FUJIFILM Corporation
Most cited
By later US patents
- Flexible intraocular lenses made from high refractive index polymers240US 5,290,892 ANestle S.A. · 1994
- Flexible, high refractive index polymers72US 5,403,901 ANestle S.A. · 1995
- Flexible intraocular lenses made from high refractive index polymers44US 5,433,746 ANestle S.A. · 1995
- Flexible high refractive index, cross-linked, acrylic copolymers43US 5,674,960 ANestle S.A. · 1997
- Intraocular lens from arylalkyl(meth)acrylate polymer(s)39US 5,861,031 ANestle S.A. · 1999