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US 2026/0277103 A1Published application
Radiation-sensitive composition, resist pattern formation method, polymer, and compound
AssigneeJsr Corporation
InventorsFumiya ESAKI, Motohiro SHIRATANI
Life of this patent
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Abstract
A polymer containing a structural unit represented by formula (1) is included in a radiation-sensitive composition. In formula (1), R1 represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group. X1 represents a single bond, *1—COO—, *1—CONH—, or a divalent aromatic cyclic group. W1 represents a (r+2)-valent organic group. X2 represents *3—COO— or —O—. G1 represents an acid-releasable group. r is 1 or 2. R2 and R3 independently represents a fluorine atom or a fluoroalkyl group. Ma+ represents an a-valent cation.
Claims13
1:
- A radiation-sensitive composition comprising a polymer comprising a structural unit represented by formula (1):
- wherein R1 represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group;
- X1 represents a single bond, *1—COO—, *1—CONH—, or a divalent aromatic cyclic group;
- *1 represents a chemical bond with the carbon atom to which R1T bonds;
- W1 represents a (r+2)-valent organic group;
- X2 represents *3—COO— or —O—;
- *3 represents a chemical bond with W1;
- G1 represents an acid-releasable group;
- r is 1 or 2;
- when r is 2, two G1s in the formula are identical to or different from each other;
- each of R2 and R3 independently represents a fluorine atom or a fluoroalkyl group;
- Ma+ represents an a-valent cation;
- and a is 1 or 2.
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2:
- The radiation-sensitive composition according to claim 1, further comprising a compound (z) which generates an acid having an acidity lower than an acidity of the acid generated by the polymer upon exposure to light.
3:
- The radiation-sensitive composition according to claim 2, wherein the compound (z) is an onium salt comprising:
- a cation;
- and an organic anion comprising an iodine atom.
4:
- The radiation-sensitive composition according to claim 3, wherein the organic anion comprises an aromatic ring and the iodine atom in the organic anion is bound to the aromatic ring.
5:
- The radiation-sensitive composition according to claim 2, wherein the compound (z) is an onium salt comprising:
- an organic anion;
- and a cation comprising a fluorine atom.
6:
- The radiation-sensitive composition according to claim 5, wherein
- the cation in the compound (z) comprises:
- a sulfonium cation or an iodonium cation;
- an aromatic ring RA bound to the sulfonium cation or the iodonium cation;
- and at least one group selected from the group consisting of a fluoroalkyl group and a fluoro group, which is other than a fluoro group in the fluoroalkyl group, the at least one group being bound to the aromatic ring RA.
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7:
- The radiation-sensitive composition according to claim 1, wherein W1 in the formula (1) comprises at least one ring selected from the group consisting of an aromatic hydrocarbon ring, an aliphatic hydrocarbon ring, or an aliphatic heterocycle, and the group represented by —X2-G1 is bound to the at least one ring.
8:
- The radiation-sensitive composition according to claim 1, wherein W1 in the formula (1) comprises a chain structure, and the group represented by —X2-G1 is bound to the chain structure.
9:
- The radiation-sensitive composition according to claim 1, wherein the polymer comprises a structural unit which comprises:
- an aromatic ring;
- and a hydroxy group bound to the aromatic ring.
10:
- The radiation-sensitive composition according to claim 1, wherein the polymer comprises a structural unit comprising:
- an acid-releasable group;
- and no onium salt structure.
11:
- A resist pattern formation method, comprising
- forming a resist film on a substrate by applying a radiation-sensitive composition according to claim 1,
- exposing the resist film to light, and
- developing the light-exposed resist film.
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12:
- A polymer comprising a structural unit represented by formula (1):
- wherein R1 represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group;
- X1 represents a single bond, *1—COO—, *1—CONH—, or a divalent aromatic cyclic group;
- *1 represents a chemical bond with the carbon atom to which R1 bonds;
- W1 represents a (r+2)-valent organic group;
- X2 represents *3—COO— or —O—;
- *3 represents a chemical bond with W1;
- G1 represents an acid-releasable group;
- r is 1 or 2;
- when r is 2, two G1s in the formula are identical to or different from each other;
- each of R2 and R3 independently represents a fluorine atom or a fluoroalkyl group;
- Ma+ represents an a-valent cation;
- and a is 1 or 2.
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13:
- A compound represented by formula (2):
- wherein R1 represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group;
- X1 represents a single bond, *1—COO—, *1—CONH—, or a divalent aromatic cyclic group;
- *1 represents a chemical bond with the carbon atom to which R1 bonds;
- W1 represents a (r+2)-valent organic group;
- X2 represents *3—COO— or —O—;
- *3 represents a chemical bond with W1;
- G1 represents an acid-releasable group;
- r is 1 or 2;
- when r is 2, two G1s in the formula are identical to or different from each other;
- each of R2 and R3 independently represents a fluorine atom or a fluoroalkyl group;
- Ma+ represents an a-valent cation;
- and a is 1 or 2.
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