C08F 22/14
Esters having no free carboxylic acid groups
C08F22/14 (Esters having no free carboxylic acid groups) appears on 40 US grants and 47 published applications in this corpus.
Search patents in C08F- Granted patents
- 40
- Published applications
- 47
- Assignees
- 35
- Inventors
- 128
- Latest grant
- 23 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 1 |
| 2002 | 1 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 1 |
| 2007 | 0 | 0 |
| 2008 | 1 | 2 |
| 2009 | 0 | 0 |
| 2010 | 0 | 1 |
| 2011 | 0 | 0 |
| 2012 | 1 | 4 |
| 2013 | 2 | 2 |
| 2014 | 2 | 2 |
| 2015 | 2 | 4 |
| 2016 | 3 | 5 |
| 2017 | 4 | 3 |
| 2018 | 3 | 1 |
| 2019 | 4 | 4 |
| 2020 | 1 | 2 |
| 2021 | 4 | 4 |
| 2022 | 0 | 2 |
| 2023 | 2 | 4 |
| 2024 | 3 | 1 |
| 2025 | 1 | 2 |
| 2026 | 2 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Curable composition for imprinting, cured substance, imprint pattern producing method, and method for manufacturing device23 Jun 2026US 12,662,559 B2FUJIFILM Corporation
- Curable composition, cured film manufactured using composition, color filter including cured film, and display device including color filter21 Apr 2026US 12,606,650 B2Samsung SDI.Co., Ltd.
- Resin composition2 Sep 2025US 12,404,388 B2Threebond Co., Ltd.
- Curing agent composition for curing 2-methylene-1,3-dicarbonyl compound19 Nov 2024US 12,146,014 B2Namics Corporation
- Hollow resin particles and sheet12 Mar 2024US 11,926,763 B2Zeon Corporation
- Novel fumaric acid ester monomer, resin, and film containing same24 Sep 2026US 2026/0286024 A1Tosoh Corporation
- Radiation-sensitive composition and method for forming resist pattern23 Jul 2026US 2026/0211327 A1Jsr Corporation
- Onium salt monomer, polymer, chemically amplified resist composition, and pattern forming process10 Apr 2025US 2025/0116934 A1Shin-Etsu Chemical Co., Ltd.
- Monomer, polymer, chemically amplified resist composition, and pattern forming process3 Apr 2025US 2025/0110405 A1Shin-Etsu Chemical Co., Ltd.
- Curable composition, cured film manufactured using composition, color filter including cured film, and display device including color filter18 Apr 2024US 2024/0124623 A1Samsung SDI.Co., Ltd.
Most cited
By later US patents
- Methods for activating polymerizable compositions, polymerizable systems, and products formed thereby79US 9,181,365 B2Sirrus, Inc. · 2015
- Method for preparing malonate methylidene nanoparticles, nanoparticles optionally containing one or several biologically active molecules62US 6,211,273 B1Virsol · 2001
- Methylidene malonate nanoparticles58US 6,420,468 B2Virsol · 2002
- On-demand photoinitiated polymerization35US 8,604,098 B2California Institute of Technology · 2013
- On-demand photoinitiated polymerization16US 8,933,143 B2California Institute of Technology · 2015