C08F 20/24
Containing perhaloalkyl radicals
Official title: containing perhaloalkyl radicals
C08F20/24 (Containing perhaloalkyl radicals) appears on 34 US grants and 36 published applications in this corpus.
Search patents in C08F- Granted patents
- 34
- Published applications
- 36
- Assignees
- 35
- Inventors
- 127
- Latest grant
- 9 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 3 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 2 | 0 |
| 1996 | 0 | 0 |
| 1997 | 1 | 0 |
| 1998 | 1 | 0 |
| 1999 | 1 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 1 |
| 2003 | 2 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 1 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 2 |
| 2012 | 0 | 3 |
| 2013 | 1 | 0 |
| 2014 | 1 | 4 |
| 2015 | 3 | 2 |
| 2016 | 0 | 1 |
| 2017 | 3 | 5 |
| 2018 | 2 | 2 |
| 2019 | 1 | 2 |
| 2020 | 1 | 0 |
| 2021 | 2 | 4 |
| 2022 | 1 | 2 |
| 2023 | 2 | 2 |
| 2024 | 2 | 1 |
| 2025 | 0 | 1 |
| 2026 | 2 | 3 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Water-resistant film layer and article thereof9 Jun 2026US 12,649,865 B2Jiangsu Favored Nanotechnology Co., Ltd.
- Amphiphilic copolymer with zwitterionic and fluorinated moieties13 Jan 2026US 12,522,683 B2Cornell University
- Silsesquioxane17 Sep 2024US 12,091,527 B2Daikin Industries, Ltd.
- Toner additives comprising composite particles23 Jul 2024US 12,045,007 B2Cabot Corporation
- Method for purifying polymerizable fluoromonomer by distillation7 Mar 2023US 11,597,696 B2Central Glass Company, Limited
- Fluorinated fluorine-containing compound, and fluorine-containing fluoropolymer and surface treatment agent using same30 Jul 2026US 2026/0217641 A1AGC Inc.
- Hydrophobic and oleophobic film layer, and method for preparing the same16 Jul 2026US 2026/0201177 A1Jiangsu Favored Nanotechnology Co., Ltd.
- Sulfonium salt monomer, polymer, chemically amplified resist composition, and pattern forming process1 Jan 2026US 2026/0001978 A1Shin-Etsu Chemical Co., Ltd.
- Curable composition, film forming method and manufacturing method13 Mar 2025US 2025/0084270 A1Canon Kabushiki Kaisha
- Surface modifier, photosensitive resin composition, cured product, and display25 Apr 2024US 2024/0134278 A1Central Glass Company, Limited
Most cited
By later US patents
- Fluorinated photoinitiators and their application in UV curing of fluorinated monomers25US 5,391,587 AAlliedSignal Inc. · 1995
- Fluorinated acrylic monomers containing urethane groups and their polymers25US 5,446,118 AW. L. Gore & Associates, Inc. · 1995
- Process for forming film of fluoroalkyl acrylate polymer on substrate and process for preparing patterned resist from the film19US 4,421,843 ADaikin Kogyo Co., Ltd. · 1983
- Radiation sensitive composition utilizing ethylenically unsaturated perfluoroalkyl group-containing compounds and reproduction layers produced therefrom16US 5,085,975 AHoechst Aktiengesellschaft · 1992
- Process for forming film of fluoroalkyl acrylate polymer on substrate and process for preparing patterned resist from the film15US 4,382,985 ADaikin Kogyo Co., Ltd. · 1983