Water-resistant film layer and article thereof
AssigneeJiangsu Favored Nanotechnology Co., Ltd.
InventorsJian Zong, Bixian Kang
Life of this patent
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Abstract
A water-resistant film layer, a preparation method therefor, and a product. The water-resistant film layer is formed on a surface of a substrate by one or more compounds shown in general formula (I) by means of a plasma chemical vapor deposition method, i.e., R1R2═R3R4 (I), wherein R1 and R2 are each independently selected from one of a group consisting of hydrogen, alkyl, halogen, haloalkyl, and aryl, at least one of R1, R2, and R3 is halogen, and R4 is a hydrophobic functional group, typically having a fluorine-containing alky structure.
Claims14
A water-resistant film layer, wherein it forms with a compound represented by the general formula (I) on the surface of a substrate by a plasma chemical vapor deposition method,
- wherein one of R1, R2, and R3 is halogen, and two of R1, R2, and R3 are hydrogen, and R4 is selected from the group consisting of —C(O)O(CH2)nCmF2m+1, and —(CH2)xCmF2m+1, wherein n and x are respectively an integer ranging from 1 to 8, and m is an integer ranging from 1 to 12.
An article with a water-resistant film layer, wherein the article is set with the water-resistant film layer, and wherein the water-resistant film layer forms with a compound represented by the general formula (I) on the surface of a substrate by a plasma chemical vapor deposition method,
- wherein one of R1, R2, and R3 is halogen, and two of R1, R2, and R3 are hydrogen, and R4 is selected from the group consisting of —C(O)O(CH2)nCmF2m+1, and —(CH2)xCmF2m+1, wherein n and x are respectively an integer ranging from 1 to 8, and m is an integer ranging from 1 to 12.
A water-resistant film layer, wherein it forms with a compound represented by the general formula (I) on the surface of a substrate by a plasma chemical vapor deposition method,
- wherein one of R1, R2, and R3 is halogen, and two of R1, R2, and R3 are hydrogen, wherein R4 is a group X—R5, and R5 is CmF2m+1 with m being integer of 1 to 8, and X is a group —C(O)O(CH2)nY—, wherein n is an integer ranging from 0 to 10, and Y is a bond or X is a group —(CH2)xU—, wherein x is an integer ranging from 1 to 10, and U is a bond.
An article with a water-resistant film layer, wherein the article is set with the water-resistant film layer, and wherein the water-resistant film layer forms with a compound represented by the general formula (I) on the surface of a substrate by a plasma chemical vapor deposition method,
- wherein one of R1, R2, and R3 is halogen, and two of R1, R2, and R3 are hydrogen, wherein R4 is a group X—R5, and R5 is CmF2m+1 with m being integer of 1 to 8, and X is a group —C(O)O(CH2)nY—, wherein n is an integer ranging from 0 to 10, and Y is a bond or X is a group —(CH2)xU—, wherein x is an integer ranging from 1 to 10, and U is a bond.
Dependencies are inferred from the claim text.