Surface modifier, photosensitive resin composition, cured product, and display
AssigneeCentral Glass Company, Limited
InventorsYuki FURUYA, Yuta SAKAIDA, Keita HATTORI, Yuzuru KANEKO
Life of this patent
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Abstract
The present disclosure aims to provide a novel surface modifier that can be introduced into a photosensitive resin composition to improve the surface roughness of a fluororesin suitable for use as a partition wall material. The present disclosure relates to a surface modifier containing a fluororesin (A) having a structure represented by the following formula (1): wherein each Ra independently represents a C1-C6 linear, C3-C6 branched, or C3-C6 cyclic alkyl group or a fluorine atom, and any number of hydrogen atoms in the alkyl group are replaced with fluorine atoms.
Claims15
A surface modifier, comprising a fluororesin (A) having a structure represented by the following formula (1):
- wherein each Ra independently represents a C1-C6 linear, C3-C6 branched, or C3-C6 cyclic alkyl group or a fluorine atom, and any number of hydrogen atoms in the alkyl group are replaced with fluorine atoms.
A method of modifying a surface of a molded article, the method comprising a fluororesin (A) having a structure represented by the following formula (1):
- wherein each Ra independently represents a C1-C6 linear, C3-C6 branched, or C3-C6 cyclic alkyl group or a fluorine atom, and any number of hydrogen atoms in the alkyl group are replaced with fluorine atoms.
Use of a fluororesin (A) having a structure represented by the following formula (1) for modifying a surface of a molded article:
- wherein each Ra independently represents a C1-C6 linear, C3-C6 branched, or C3-C6 cyclic alkyl group or a fluorine atom, and any number of hydrogen atoms in the alkyl group are replaced with fluorine atoms.
Dependencies are inferred from the claim text.