Silsesquioxane
AssigneesOchanomizu University, Daikin Industries, Ltd.
InventorsTomoko Yajima, Moeka Sano, Tadashi Kanbara, Tsuyoshi Noguchi
Life of this patent
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Abstract
A silsesquioxane compound represented by the following formula (I): (RaSiO1.5)n, wherein Ra is, each independently at each occurrence, Rb or Rc; provided that at least one Ra is Rb; Rb is —R1—CF2—R2—R3; R1 is a divalent group; R2 is a divalent polymer chain; R3 is a halogen atom or a hydrogen atom; Rc is a hydrogen atom, an alkyl group, a phenyl group, or —(OSiR152)j—R15; R15 is, each independently at each occurrence, a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; j is, each independently at each occurrence, an integer of 1 to 3; and n is an arbitrary integer.
Claims4
A silsesquioxane compound represented by the following formula (I):
- (RaSiO1.5)n
- wherein
- Ra is, each independently at each occurrence, Rb or Rc;
- provided that at least one Ra is Rb;
- Rb is —R1—CF2—R2—R3;
- R1 is —(CF2)s1—or —(CF2)t1O(CF2)t2—;
- s1 is an integer of 2 to 10;
- t1 and t2 are each independently an integer of 2 to 6;
- R2 is a divalent polymer chain;
- R3 is a halogen atom or a hydrogen atom;
- Rc is a hydrogen atom, an alkyl group, a phenyl group, or —(OSiR152)j—R15;
- R15 is, each independently at each occurrence, a hydrogen atom or an alkyl group having 1 to 6 carbon atoms;
- j is, each independently at each occurrence, an integer of 1 to 3;
- and
- n is an integer of 4 or more.
Dependencies are inferred from the claim text.