C07F 7/2224
Compounds having one or more tin-oxygen linkages
Official title: {Compounds having one or more tin-oxygen linkages}
C07F7/2224 (Compounds having one or more tin-oxygen linkages) appears on 203 US grants and 172 published applications in this corpus.
Search patents in C07F- Granted patents
- 203
- Published applications
- 172
- Assignees
- 121
- Inventors
- 525
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 6 | 0 |
| 1977 | 9 | 0 |
| 1978 | 12 | 0 |
| 1979 | 6 | 0 |
| 1980 | 6 | 0 |
| 1981 | 5 | 0 |
| 1982 | 6 | 0 |
| 1983 | 5 | 0 |
| 1984 | 8 | 0 |
| 1985 | 6 | 0 |
| 1986 | 6 | 0 |
| 1987 | 4 | 0 |
| 1988 | 4 | 0 |
| 1989 | 1 | 0 |
| 1990 | 5 | 0 |
| 1991 | 9 | 0 |
| 1992 | 5 | 0 |
| 1993 | 2 | 0 |
| 1994 | 1 | 0 |
| 1995 | 5 | 0 |
| 1996 | 2 | 0 |
| 1997 | 6 | 0 |
| 1998 | 2 | 0 |
| 1999 | 2 | 0 |
| 2000 | 3 | 0 |
| 2001 | 5 | 1 |
| 2002 | 2 | 2 |
| 2003 | 1 | 0 |
| 2004 | 0 | 1 |
| 2005 | 2 | 0 |
| 2006 | 0 | 1 |
| 2007 | 0 | 0 |
| 2008 | 1 | 1 |
| 2009 | 1 | 0 |
| 2010 | 0 | 3 |
| 2011 | 1 | 3 |
| 2012 | 2 | 2 |
| 2013 | 0 | 3 |
| 2014 | 1 | 3 |
| 2015 | 2 | 3 |
| 2016 | 2 | 5 |
| 2017 | 5 | 1 |
| 2018 | 3 | 5 |
| 2019 | 3 | 4 |
| 2020 | 3 | 4 |
| 2021 | 3 | 13 |
| 2022 | 2 | 11 |
| 2023 | 8 | 11 |
| 2024 | 13 | 35 |
| 2025 | 5 | 40 |
| 2026 | 12 | 20 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Semiconductor photoresist composition and method of forming patterns using the composition29 Sep 2026US 12,748,348 B2Samsung SDI.Co., Ltd.
- Tin compound and resist solution using the same, pattern forming method, thin film, patterned thin film, and method for producing tin compound11 Aug 2026US 12,703,713 B2Gelest, Inc.
- Semiconductor photoresist composition and method of forming patterns using the composition4 Aug 2026US 12,699,319 B2Dct Material LLC
- Organometallic compound comprising a metal combined with at least one ligand containing four or more fluorine atoms, resist composition comprising the same, and method of fabricating semiconductor device using the same28 Jul 2026US 12,693,595 B2Inha University Research and Business Foundation
- Organometallic compounds for the deposition of high purity tin oxide and dry etching of the tin oxide films and deposition reactors16 Jun 2026US 12,655,164 B2Seastar Chemicals Ulc
- Semiconductor photoresist composition and method of forming patterns using the composition17 Sep 2026US 2026/0277100 A1Samsung SDI.Co., Ltd.
- Semiconductor photoresist composition and method of forming patterns using the composition20 Aug 2026US 2026/0244093 A1Samsung SDI.Co., Ltd.
- Compounds and processes for extreme ultraviolet lithography30 Jul 2026US 2026/0217742 A1Entegris, Inc.
- Iodoalkyl tin compounds and preparation methods thereof16 Jul 2026US 2026/0200958 A1Gelest, Inc.
- Methods for producing and purifying organotin compounds, suppressing formation of dialkyl tin compounds, and selectively removing tetrakis(dialkylamino) tin compounds16 Jul 2026US 2026/0200959 A1Gelest, Inc.
Most cited
By later US patents
- Tin compound-containing compositions as one of the two components of two component systems which crosslink at room temperature to give organopolysiloxane elastomers67US 5,597,882 AWacker Chemie AG · 1997
- Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods44US 10,787,466 B2Inpria Corporation · 2020
- (Hydrocarbylphenylsulfonyl)alkyltrimethylstannanes34US 3,976,672 AUniroyal, Inc. · 1976
- Trisstannoxanes useful for polymerizing macrocyclic poly(alkylene dicarboxylate) oligomers33US 5,386,037 AGeneral Electric Company · 1995
- Process for recovery of organotin esters from reaction mixtures containing the same and re-use of the recovered organotin compounds27US 5,034,551 ANoramco, Inc. · 1991