Semiconductor photoresist composition and method of forming patterns using the composition

A semiconductor photoresist composition, comprising

• an organometallic compound represented by Chemical Formula 1, and
• a solvent:
• wherein, in Chemical Formula 1,
• M1 to M3 are each independently one metal selected from Sn, Sb, Te, I, Ti, Bi, Po, At, In, Ag, Au, Pt, Si, Al, or Ga,
• R1 to R6 are each independently a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C2 to C20 alkenyl group, a substituted or unsubstituted C3 to C20 cycloalkenyl group, a substituted or unsubstituted C2 to C20 alkynyl group, a substituted or unsubstituted C3 to C20 cycloalkynyl group, a substituted or unsubstituted C6 to C30 aryl group, a functional group containing at least one heteroatom selected from O, S, Si, N, Se, Te, P, Ge, Sn, Al, or In, or a combination thereof, and
• at least one of R1 to R6 is a functional group containing at least one heteroatom selected from O, S, Si, N, Se, Te, P, Ge, Sn, Al, or In.