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US 2026/0277100 A1Published application
Semiconductor photoresist composition and method of forming patterns using the composition
AssigneeSamsung SDI Co., Ltd.
InventorsMiyeon HAN, Bukeun OH, Jaeyeol BAEK, Jung Min CHOI, Seol Hee LIM, Seunghwan BYUN, Hyejin JANG, Jonghyuk JEON, Sanghoon SHIN
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Abstract
A semiconductor photoresist composition and a method of forming patterns using the semiconductor photoresist composition are provided. The semiconductor photoresist composition includes an organometallic compound, a compound including four or more hydroxyl groups and one or more ether bonds, and a solvent.
Claims17
A semiconductor photoresist composition, comprising
- an organometallic compound;
- a compound comprising four or more hydroxyl groups and one or more ether bonds;
- and
- a solvent.
1 more element
Dependencies are inferred from the claim text.