C07D 347/00
Heterocyclic compounds containing rings having halogen atoms as ring hetero atoms
C07D347/00 (Heterocyclic compounds containing rings having halogen atoms as ring hetero atoms) appears on 27 US grants and 24 published applications in this corpus.
Search patents in C07D- Granted patents
- 27
- Published applications
- 24
- Assignees
- 28
- Inventors
- 66
- Latest grant
- 6 May 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1980 | 1 | 0 |
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 2 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 3 |
| 2004 | 1 | 0 |
| 2005 | 1 | 0 |
| 2006 | 0 | 0 |
| 2007 | 1 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 1 |
| 2014 | 0 | 0 |
| 2015 | 0 | 1 |
| 2016 | 2 | 1 |
| 2017 | 0 | 3 |
| 2018 | 4 | 0 |
| 2019 | 0 | 5 |
| 2020 | 4 | 3 |
| 2021 | 1 | 1 |
| 2022 | 1 | 2 |
| 2023 | 3 | 0 |
| 2024 | 1 | 1 |
| 2025 | 1 | 0 |
| 2026 | 0 | 3 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method for functionalization of an aromatic amino acid or a nucleobase6 May 2025US 12,291,550 B2CF Plus Chemicals s.r.o.
- Method for producing triarylorganoborates23 Jul 2024US 12,043,636 B2Covestro Intellectual Property GmbH & Co.KG
- Method for producing triarylorganoborates19 Sep 2023US 11,760,765 B2Covestro Intellectual Property GmbH & Co.KG
- Trifluoromethoxylation of arenes via intramolecular trifluoromethoxy group migration15 Aug 2023US 11,724,982 B2The Research Foundation for The State University of New York
- Environmentally-friendly hydroazidation of olefins25 Jul 2023US 11,708,320 B2Georgia State University Research Foundation, Inc.
- Resist composition, laminate, and patterning process16 Jul 2026US 2026/0202745 A1Shin-Etsu Chemical Co., Ltd.
- Glycosylation and alkylation method involving benziodoxole reagent11 Jun 2026US 2026/0159507 A1Huazhong University of Science and Technology
- Iodonium salt, chemically amplified positive resist composition and resist pattern forming process26 Feb 2026US 2026/0056469 A1Shin-Etsu Chemical Co., Ltd.
- Method for producing triarylorganoborates4 Jan 2024US 2024/0002409 A1Covestro Deutschland AG
- A method for functionalization of an aromatic amino acid or a nucleobase9 Jun 2022US 2022/0177514 A1CF Plus Chemicals s.r.o.
Most cited
By later US patents
- Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition83US 6,908,722 B2Jsr Corporation · 2005
- Radiation-sensitive resin composition19US 7,288,359 B2Jsr Corporation · 2007
- Photoresist composition, compound and process of producing photoresist pattern14US 9,448,475 B2Sumitomo Chemical Company, Limited · 2016
- Compound, active light sensitive or radiation sensitive resin composition, resist film using same, resist-coated mask blank, photomask, pattern forming method, method for manufacturing electronic device, and electronic device8US 9,904,167 B2FUJIFILM Corporation · 2018
- Novel oxiodinium and thiaiodinium compounds4US 4,193,935 AEli Lilly and Company · 1980