Resist composition, laminate, and patterning process

A resist composition comprising at least one kind of hypervalent iodine compounds selected from the following formulae (1), (2), and (3), a carboxy group-containing compound, and a solvent,

• wherein n1 represents 0, 1, or 2;
• n2 represents 0, 1, or 2;
• n3 represents 0, 1, 2, or 3;
• R11 to R13 each independently represent a halogen atom or a hydrocarbyl group having 1 to 10 carbon atoms and optionally having a heteroatom;
• X1 to X3 each independently represent *—O—XA1— or *—XA2(—R14)—C(═O)—;
• X3 may be *—S—XA1—;
• XA1 represents a carbonyl group or a hydrocarbylene group having 1 to 10 carbon atoms and optionally having a heteroatom;
• XA2 represents nitrogen or sulfur, and when XA2 is nitrogen, R14 may be included;
• R14 represents a hydrogen atom, a halogen atom, or a hydrocarbyl group or ester having 1 to 20 carbon atoms and optionally having a heteroatom;
• “*” represents a bond to an iodine atom in the formula;
• *1, *2, *3, *4, *5, and *6 represent a bond to a carbon atom or a heteroatom of the heterocycle in the formula, and *1, *2, *3, *4, *5, and *6 are bonded to adjacent carbon atoms or heteroatoms of the heterocycle;
• R21 to R24 each independently represent a halogen atom, a hydrocarbyl group having 1 to 40 carbon atoms and optionally having a heteroatom, —NH2, —NO2, —SF5, —N(CH3)2, —N(C2H5)2, —OH, or —CN;
• R22 may be a hydrogen atom;
• When n1 is 2 or more, R21s each may be identical to or different from each other, and a plurality of R21s may be bonded to each other to form a ring together with the carbon atoms of the heteroaromatic ring to which they are bonded;
• and when n3 is 2 or more, R24s each may be identical to or different from each other, and a plurality of R24s may be bonded to each other to form a ring together with the carbon atoms of the heteroaromatic ring to which they are bonded, provided that R22 is X2 when X2 is bonded to a nitrogen atom to which R22 is bonded.