Compound, active light sensitive or radiation sensitive resin composition, resist film using same, resist-coated mask blank, photomask, pattern forming method, method for manufacturing electronic device, and electronic device
AssigneeFUJIFILM Corporation
InventorTomotaka Tsuchimura
Life of this patent
Estimating the term…
Abstract
Provided is an active light sensitive or radiation sensitive resin composition which contains a compound (A) represented by General Formula (I) or (II): in the formulae, each of Y1 and Y2 represents a monovalent organic group; each of M1+ and M2+ represents an organic onium ion; each of X1 and X2 represents a group that is represented by —S—, —NH—, or —NR1—; R1 represents a monovalent organic group; each of n1 and n2 represents an integer of 1 or more; and R1 and Y1 or Y2 may bond with each other to form a ring.
Claims17
An active light sensitive or radiation sensitive resin composition comprising:
- a compound (A) represented by General Formula (I) below,
- in the formula,
- Y1 represents a monovalent organic group;
- M1+ represents an organic onium ion;
- X1 represents a group which is represented by —S—, —NH—, or —NR1—;
- R1 represents a monovalent organic group;
- n1 represents an integer of 1 or more;
- and
- R1 and Y1 may bond with each other to form a ring;
- (B) a resin, and
- a solvent,
- wherein, in General Formula (I), Y1 is a monovalent hydrocarbon group which has an alicyclic hydrocarbon structure having 5 or more carbon atoms.
A compound represented by General Formula (I-I) below:
- in the formula,
- X′ represents —S— or —NH—;
- n′ represents an integer of 1 to 3;
- Y′ represents an aryl group or a monovalent hydrocarbon group which has an alicyclic hydrocarbon structure having 5 or more carbon atoms;
- and
- M′+ represents a sulfonium cation or an iodonium cation.
An active light sensitive or radiation sensitive resin composition comprising:
- a compound (A) represented by General Formula (I) or (II) below,
- in the formulae,
- each of Y1 and Y2 represents a monovalent organic group;
- each of M1+ and M2+ represents an organic onium ion;
- each of X1 and X2 represents a group which is represented by —S—;
- each of n1 and n2 represents an integer of 1 or more;
- and
- R1 and Y1 or Y2 may bond with each other to form a ring;
- (B) a resin;
- and
- a solvent.
Dependencies are inferred from the claim text.