Radiation-sensitive resin composition

A radiation sensitive resin composition comprising (A) an acid-dissociable group-containing polysiloxane and (B) a compound which generates an acid of the following formula (I),

• wherein each Rf individually represents a fluorine atom or a trifluoromethyl group, and wherein Ra is:
• a substituted or unsubstituted monovalent cyclic hydrocarbon group having 3-20 carbon atoms;
• a substituted or unsubstituted monovalent cyclic fluoro-hydrocarbon group having 3-20 carbon atoms;
• or
• a group of any one of the following formulas (16)-(22):
• wherein R8 individually represents a hydrogen atom, halogen atom, hydroxyl group, acetyl group, carboxyl group, nitro group, cyano group, primary amino group, secondary amino group, linear or branched alkoxyl group having 1-10 carbon atoms, linear or branched alkyl group having 1-10 carbon atoms, or linear or branched fluoroalkyl group having 1-10 carbon atoms, R9 individually represents a hydrogen atom, halogen atom, linear or branched alkyl group having 1-10 carbon atoms, or a linear or branched fluoroalkyl group having 1-10 carbon atoms, and m is an integer of 0-10,
• wherein R8, R9, and m are the same as defined in the formula (16),
• wherein R8, R9, and m are the same as defined in the formula (16),
• wherein R8, R9, and m are the same as defined in the formula (16), and n is an integer of 1-18,
• wherein R8, R9, and m are the same as defined in the formula (16), and p is an integer of 0-3,
• wherein R8, R9, and m are the same as defined in the formula (16), and
• wherein R9 and m are the same as defined in the formula (16), and Me is a methyl group.