Y10S 451/921
Pad for lens shaping tool
Y10S451/921 (Pad for lens shaping tool) appears on 104 US grants and 42 published applications in this corpus.
Search patents in Y10S- Granted patents
- 104
- Published applications
- 42
- Assignees
- 46
- Inventors
- 131
- Latest grant
- 17 Mar 2015
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 2 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 3 | 0 |
| 1991 | 2 | 0 |
| 1992 | 2 | 0 |
| 1993 | 1 | 0 |
| 1994 | 4 | 0 |
| 1995 | 2 | 0 |
| 1996 | 2 | 0 |
| 1997 | 5 | 0 |
| 1998 | 7 | 0 |
| 1999 | 7 | 0 |
| 2000 | 6 | 0 |
| 2001 | 4 | 4 |
| 2002 | 5 | 2 |
| 2003 | 7 | 8 |
| 2004 | 6 | 4 |
| 2005 | 12 | 7 |
| 2006 | 6 | 9 |
| 2007 | 6 | 1 |
| 2008 | 2 | 1 |
| 2009 | 2 | 1 |
| 2010 | 2 | 2 |
| 2011 | 1 | 1 |
| 2012 | 1 | 1 |
| 2013 | 0 | 1 |
| 2014 | 2 | 0 |
| 2015 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Polishing tool for processing optical surfaces17 Mar 2015US 8,979,618 B2Carl Zeiss Vision GmbH
- Optical quality surfacing tool25 Nov 2014US 8,894,471 B2Essilor International (Compagnie Generale D Optique)
- Polishing instrument for optical components15 Apr 2014US 8,696,412 B2Zenni Optical, Inc.
- Polishing pad28 Feb 2012US 8,123,597 B2Bestac Advanced Material Co., Ltd.
- High-rate groove pattern22 Nov 2011US 8,062,103 B2Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Polishing Instrument for Optical Components4 Jul 2013US 2013/0171916 A1Zenni Optical, Inc.
- Optical quality surfacing tool13 Sep 2012US 2012/0231713 A1Essilor International (Compagnie Generale D Optique)
- Polishing tool for processing optical surfaces10 Nov 2011US 2011/0275295 A1Carl Zeiss Vision GmbH
- High-rate groove pattern24 Jun 2010US 2010/0159811 A1Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Polishing Pad29 Apr 2010US 2010/0105303 A1Bestac Advanced Material Co., Ltd.
Most cited
By later US patents
- Polishing pad with uniform abrasion215US 5,020,283 AMicron Technology, Inc. · 1991
- Polishing pad205US 5,177,908 AMicron Technology, Inc. · 1993
- Polishing pad with controlled abrasion rate177US 5,297,364 AMicron Technology, Inc. · 1994
- Polishing pad and a method for making a polishing pad with covalently bonded particles174US 5,624,303 AMicron Technology, Inc. · 1997
- Apparatus for separating wafers from polishing pads used in chemical-mechanical planarization of semiconductor wafers134US 5,658,190 AMicron Technology, Inc. · 1997