US 2010/0159811 A1Published application

High-rate groove pattern

AssigneeRohm and Haas Electronic Materials CMP Holdings, Inc.

InventorGregory P. Muldowney

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Abstract

The invention provides a polishing pad useful for polishing at least one of a magnetic, optical and semiconductor substrate in the presence of a polishing medium with a polishing pad. The polishing pad comprises a center, an inner region surrounding the center, a transition region connecting grooves from the inner region to an outer region surrounding the inner region. The outer region has multiple grooves with a high-rate path. The transition region is adjacent the outer region and within a radius from the center defined as follows: r TR = 0.7  r *   to   1.3  r * where r * = R C  ( R R C ) 2 - cos  ( 2  θ c   0 ) - sin  ( 2  θ c   0 )  ( R / R c cos   θ c   0 ) 2 - 1 ; with the inner region originating continuous grooves that extend uninterrupted to the outer region.

Claims10

Dependent claims

A polishing pad useful for polishing at least one of a magnetic, optical and semiconductor substrate in the presence of a polishing medium with a polishing pad, the polishing pad comprising:

a center,
an inner region surrounding the center,
a transition region connecting grooves from the inner region to an outer region surrounding the inner region, the outer region having multiple grooves, the multiple grooves having a high-rate path, at least fifty percent of the high-rate path being within twenty percent of a groove trajectory φ(r) in polar coordinates referenced to the concentric center of the polishing pad and defined in terms of (1) the distance R between the concentric center of the polishing pad and the rotational center of the substrate being polished, (2) the radius Rc of the carrier fixture, and (3) the local angle θc0 of grooves in the carrier fixture, defined with a groove equation as follows:
φ

(
r
)
=
∫
R
-
R
C
r

R
R
C

sin


φ
c
+
(
tan


θ
c


0
)

(
R
R
C

cos


φ
c
+
1
)
(
R
R
C

cos


φ
c
+
1
)
-
(
tan


θ
c


0
)

R
R
C

sin


φ
c



r
′
r
′
where
φ
c
=
cos
-
1
(
R
2
+
R
C
2
-
r
2
2

RR
C
)
-
π
for


values


of


r


from


(
R
-
R
C
)


to


(
R
-
R
C
)
the transition region being adjacent the outer region and within a radius from the center defined as follows:
r
TR
=
0.7

r
*


to


1.3

r
*
where
r
*
=
R
C

(
R
R
C

)
2
-
cos

(
2

θ
c


0
)
-
sin


(
2


θ
c


0
)

(
R
/
R
C
cos


θ
c


0
)
2
-
1
;
and wherein the inner region originates continuous grooves that extend uninterrupted to the outer region.

221 more elements

Dependencies are inferred from the claim text.

Facts

Application: 12/317,572Filed 23 Dec 2008
Published: 24 Jun 2010
Term ends: Not estimatedThe source records don’t support an estimate.

Classification4 codes

B24B 37/26
Lapping pads for working plane surfaces: characterised by the shape of the lapping pad surface, e.g. grooved
Y10S 451/921
Abrading: pad for lens shaping tool
B24B
Machines, devices, or processes for grinding or polishing
Y10S
Technical subjects covered by former uspc cross-reference art collections [xracs] and digests

Family

US 8,062,103 B2Related patent
US 2010/0159811 A1This patent

From the US filing history. Foreign family members aren’t listed.

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