Y02C 20/30
Capture or disposal of greenhouse gases: of perfluorocarbons [pfc], hydrofluorocarbons [hfc] or
Official title: of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]
Y02C20/30 (Capture or disposal of greenhouse gases: of perfluorocarbons [pfc], hydrofluorocarbons [hfc] or) appears on 564 US grants and 607 published applications in this corpus.
Search patents in Y02C- Granted patents
- 564
- Published applications
- 607
- Assignees
- 322
- Inventors
- 1,515
- Latest grant
- 16 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 2 | 0 |
| 1978 | 1 | 0 |
| 1979 | 2 | 0 |
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 3 | 0 |
| 1991 | 1 | 0 |
| 1992 | 7 | 0 |
| 1993 | 4 | 0 |
| 1994 | 2 | 0 |
| 1995 | 8 | 0 |
| 1996 | 5 | 0 |
| 1997 | 8 | 0 |
| 1998 | 14 | 0 |
| 1999 | 19 | 0 |
| 2000 | 20 | 0 |
| 2001 | 26 | 14 |
| 2002 | 27 | 40 |
| 2003 | 29 | 37 |
| 2004 | 20 | 39 |
| 2005 | 23 | 19 |
| 2006 | 13 | 22 |
| 2007 | 12 | 24 |
| 2008 | 11 | 24 |
| 2009 | 16 | 32 |
| 2010 | 16 | 21 |
| 2011 | 17 | 17 |
| 2012 | 7 | 7 |
| 2013 | 17 | 20 |
| 2014 | 17 | 14 |
| 2015 | 13 | 29 |
| 2016 | 13 | 19 |
| 2017 | 15 | 29 |
| 2018 | 20 | 27 |
| 2019 | 22 | 32 |
| 2020 | 30 | 31 |
| 2021 | 24 | 24 |
| 2022 | 14 | 21 |
| 2023 | 17 | 34 |
| 2024 | 19 | 13 |
| 2025 | 21 | 7 |
| 2026 | 6 | 11 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Catalyst for decomposing perfluorinated compounds and method of manufacturing the catalyst16 Jun 2026US 12,654,155 B2Korea Advanced Institute of Science and Technology
- Plasma device for treating exhaust gas26 May 2026US 12,641,705 B2Plasma Science System Co., Ltd.
- Systems and methods for ozone degradation for a plasma treatment system14 Apr 2026US 12,600,626 B2Illinois Tool Works Inc.
- Substrate processing apparatus, substrate processing method, method of manufacturing semiconductor device and non-transitory computer-readable recording medium14 Apr 2026US 12,601,052 B2Kokusai Electric Corporation
- Methods for regenerating a filter medium and cleaning flue gas7 Apr 2026US 12,594,519 B2W. L. Gore & Associates, Inc.
- Catalyst for decomposing perfluorocompounds27 Aug 2026US 2026/0249272 A1Ecoprohn
- Discharge gas treatment method and discharge gas treatment device23 Jul 2026US 2026/0208102 A1Resonac Corporation
- Exhaust gas pretreatment equipment for semiconductor manufacturing facilities16 Jul 2026US 2026/0199826 A1Lot Ces Co., Ltd.
- An abatement system for treatment of exhaust gases of a vacuum processing system2 Jul 2026US 2026/0183706 A1Edwards Limited
- Downstream port gases introduced into plasma abatement system25 Jun 2026US 2026/0179884 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas571US 6,863,019 B2APPLIED Materials.Inc. · 2005
- Electrochemical production of ozone and hydrogen peroxide465US 5,972,196 ALynntech, Inc. · 1999
- Method and apparatus for treating exhaust gases from CVD, PECVD or plasma etch reactors430US 5,928,426 ANovellus Systems, Inc. · 1999
- Reactor chamber self-cleaning process410US 4,960,488 AAPPLIED Materials.Inc. · 1990
- Trap apparatus382US 6,488,774 B1Ebara Corporation · 2002