Discharge gas treatment method and discharge gas treatment device
AssigneeResonac Corporation
InventorsKunchan LEE, Kazuki IWAGAKI
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AssigneeResonac Corporation
InventorsKunchan LEE, Kazuki IWAGAKI
Estimating the term…
Provided is a discharge gas treatment method capable of decomposing chlorine gas and a perfluorocompound in a discharge gas containing the chlorine gas and the perfluorocompound, resulting in a gas having a low chlorine gas concentration and a low perfluorocompound concentration. The discharge gas treatment method is a method of treating a discharge gas containing chlorine gas and a perfluorocompound and includes a chlorine gas decomposition step of decomposing the chlorine gas in the discharge gas by thermally reacting the chlorine gas with water, a hydrogen chloride removal step of removing hydrogen chloride from the gas after the chlorine gas decomposition step, and a perfluorocompound decomposition step of decomposing the perfluorocompound in the gas after the hydrogen chloride removal step by reacting the perfluorocompound in the presence of a perfluorocompound decomposition catalyst.
A method of treating a discharge gas containing chlorine gas and a perfluorocompound, the discharge gas treatment method comprising:
A device of treating a discharge gas containing chlorine gas and a perfluorocompound, the discharge gas treatment device comprising:
Dependencies are inferred from the claim text.