H05H 1/4652
Using inductive coupling means
Official title: {using inductive coupling means, e.g. coils}
H05H1/4652 (Using inductive coupling means) appears on 250 US grants and 316 published applications in this corpus.
Search patents in H05H- Granted patents
- 250
- Published applications
- 316
- Assignees
- 156
- Inventors
- 563
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 1 | 0 |
| 1998 | 1 | 0 |
| 1999 | 2 | 0 |
| 2000 | 1 | 0 |
| 2001 | 2 | 0 |
| 2002 | 1 | 1 |
| 2003 | 1 | 1 |
| 2004 | 0 | 4 |
| 2005 | 2 | 3 |
| 2006 | 1 | 4 |
| 2007 | 6 | 8 |
| 2008 | 1 | 4 |
| 2009 | 6 | 4 |
| 2010 | 5 | 4 |
| 2011 | 2 | 7 |
| 2012 | 3 | 17 |
| 2013 | 6 | 22 |
| 2014 | 12 | 30 |
| 2015 | 14 | 20 |
| 2016 | 30 | 20 |
| 2017 | 23 | 23 |
| 2018 | 17 | 20 |
| 2019 | 19 | 22 |
| 2020 | 23 | 13 |
| 2021 | 11 | 13 |
| 2022 | 11 | 13 |
| 2023 | 8 | 15 |
| 2024 | 14 | 18 |
| 2025 | 20 | 16 |
| 2026 | 5 | 14 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Transformer device and plasma generating apparatus containing the same22 Sep 2026US 12,744,148 B2National Cheng Kung University
- Monolithic modular high-frequency plasma source7 Jul 2026US 12,676,289 B2APPLIED Materials.Inc.
- Plasma radio-frequency waveguide switch23 Jun 2026US 12,666,521 B2Northrop Grumman Systems Corporation
- Remote plasma source (RPS) power coupling circuit and control system9 Jun 2026US 12,652,748 B2Jiangsu Shenzhou Semiconductor Technology Co., Ltd
- Plasma generating device, plasma processing device, and plasma etching device for seamless roller mold27 Jan 2026US 12,538,409 B2Asahi Kasei Kabushiki Kaisha
- Monolithic modular high-frequency plasma source1 Oct 2026US 2026/0302134 A1APPLIED Materials.Inc.
- Rf coil resonator systems and methods17 Sep 2026US 2026/0282203 A1Standard BioTools Canada Inc.
- Discharge and Modulation System and Method for Microwave-Radio Frequency (RF) Mixed Coupled Plasma23 Jul 2026US 2026/0214780 A1
- Matchless plasma source for semiconductor wafer fabrication4 Jun 2026US 2026/0156736 A1Lam Research Corporation
- Matchless plasma source for semiconductor wafer fabrication28 May 2026US 2026/0150176 A1Lam Research Corporation
Most cited
By later US patents
- Plasma source for HDP-CVD chamber295US 5,944,902 AAPPLIED Materials.Inc. · 1999
- Remote plasma source generating a disc-shaped plasma94US 8,884,525 B2Advanced Energy Industries, Inc. · 2014
- Parallel plate apparatus for in-situ vacuum line cleaning for substrate processing equipment90US 6,193,802 B1APPLIED Materials.Inc. · 2001
- Induction plasma tube75US 4,431,901 AThe United States of America as represented by the United States Department of Energy · 1984
- Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions71US 6,187,072 B1APPLIED Materials.Inc. · 2001