Plasma source for HDP-CVD chamber
AssigneeApplied Materials, Inc.
InventorsFred C. Redeker, Tetsuya Ishikawa
Life of this patent
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Abstract
A plasma system is disclosed for processing a substrate and includes a chamber body defining a plasma cavity therein and having a centrally located gas inlet, and a top antenna configured in position relative to the plasma cavity to produce a center-peaked plasma density profile above the substrate during operation. The top antenna has a central passage which surrounds the centrally located gas inlet. A side antenna is preferably configured and positioned relative to the plasma chamber to produce a hollow-center plasma density profile above the substrate during operation. Together, the top and side antennas and the centrally located gas inlet provide a uniform plasma directly over the surface of the substrate to be processed.
Claims18
An antenna for generating a plasma within a processing chamber, comprising:
- a central coil defining a central passage through the antenna;
- an outer coil disposed about the central coil;
- and
- a plurality of conductors extending between the central coil and the outer coil.
An electromagnetic wave generating apparatus, comprising:
- a single antenna disposed adjacent one end of a processing cavity comprising one single-turn conductive loop defining a central passage, having a first lead connected to a first signal generating system and a second lead connected to ground;
- and
- a conductive coil disposed around the processing cavity and linearly displaced from the single-turn conductive loop.
An apparatus for generating a uniform plasma, comprising:
- a first antenna comprising:
- (i) a first conducting coil defining a central passage;
- (ii) a second conducting coil disposed about the first conducting coil;
- and
- (iii) a plurality of conductors extending between the first conducting coil and the second conducting coil;
- and
- a second antenna comprising a third conducting coil that is spatially offset from the first and second conducting coils and at least partially surrounding a processing region.
A method for generating a plasma, comprising:
- providing a first conducting coil defining a central passage and disposed adjacent a reaction zone;
- disposing a second conducting coil about the first conducting coil and disposed adjacent the reaction zone;
- connecting the first conducting coil to the second conducting coil by a plurality of conductors;
- coupling an RF signal generator to at least one of the first conducting coil and the second conducting coil;
- and
- positioning a third conducting coil at least linearly displaced from the first and second conducting coils;
- and
- coupling the third conducting coil to the RF signal generator.
Dependencies are inferred from the claim text.