H05H 1/461
Microwave discharges
Official title: {Microwave discharges}
H05H1/461 (Microwave discharges) appears on 340 US grants and 456 published applications in this corpus.
Search patents in H05H- Granted patents
- 340
- Published applications
- 456
- Assignees
- 223
- Inventors
- 824
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 3 | 0 |
| 2000 | 2 | 0 |
| 2001 | 7 | 0 |
| 2002 | 6 | 15 |
| 2003 | 10 | 8 |
| 2004 | 7 | 13 |
| 2005 | 6 | 6 |
| 2006 | 3 | 18 |
| 2007 | 8 | 7 |
| 2008 | 3 | 7 |
| 2009 | 10 | 11 |
| 2010 | 4 | 15 |
| 2011 | 4 | 8 |
| 2012 | 7 | 21 |
| 2013 | 7 | 16 |
| 2014 | 15 | 41 |
| 2015 | 14 | 34 |
| 2016 | 29 | 16 |
| 2017 | 23 | 14 |
| 2018 | 26 | 29 |
| 2019 | 19 | 26 |
| 2020 | 22 | 26 |
| 2021 | 15 | 20 |
| 2022 | 19 | 14 |
| 2023 | 11 | 37 |
| 2024 | 22 | 27 |
| 2025 | 26 | 12 |
| 2026 | 11 | 15 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Plasma apparatus and methods for processing feed material utilizing an upstream swirl module and composite gas flows25 Aug 2026US 12,719,024 B26K Inc.
- Reactor and system for fabrication of free-standing two-dimensional nanostructures using plasma technology18 Aug 2026US 12,709,544 B2Instituto Superior Tecnico
- Power generation and methods regarding same30 Jun 2026US 12,669,080 B2Brilliant Light Power, Inc.
- Magnetically enhanced VUV lamp9 Jun 2026US 12,652,746 B1Uchicago Argonne, LLC
- Method for generating microwave-driven plasma19 May 2026US 12,635,062 B2Direct Air Capture, LLC
- Power generation and methods regarding same24 Sep 2026US 2026/0286883 A1Brilliant Light Power, Inc.
- Modulated pulsed microwave waveform in a power source for achieving a desired electron energy distribution in a plasma27 Aug 2026US 2026/0255468 A1Starfire Industries LLC
- Remote Surface Wave Propagation for Semiconductor Chamber13 Aug 2026US 2026/0237603 A1APPLIED Materials.Inc.
- Discharge and Modulation System and Method for Microwave-Radio Frequency (RF) Mixed Coupled Plasma23 Jul 2026US 2026/0214780 A1
- Coherent or pristine graphene in a polymer matrix16 Jul 2026US 2026/0201532 A1Lyten, Inc.
Most cited
By later US patents
- Apparatus and method for treating a workpiece using plasma generated from microwave radiation428US 6,841,201 B2The Procter & Gamble Company · 2005
- Guided wave applicator with non-gaseous dielectric for plasma chamber191US 9,397,380 B2APPLIED Materials.Inc. · 2016
- Electromagnetic-radiation power-supply mechanism for exciting a coaxial waveguide by using first and second poles and a ring-shaped reflection portion183US 9,072,158 B2Tokyo Electron Limited · 2015
- Plasma nozzle array for providing uniform scalable microwave plasma generation171US 7,806,077 B2Amarante Technologies, Inc. · 2010
- Microwave plasma chemical synthesis of ultrafine powders120US 6,409,851 B1Materials Modifciation, Inc. · 2002