H05H 1/4615
Using surface waves
Official title: {using surface waves}
H05H1/4615 (Using surface waves) appears on 16 US grants and 21 published applications in this corpus.
Search patents in H05H- Granted patents
- 16
- Published applications
- 21
- Assignees
- 12
- Inventors
- 59
- Latest grant
- 18 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2004 | 0 | 1 |
| 2005 | 0 | 0 |
| 2006 | 1 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 1 | 0 |
| 2012 | 1 | 0 |
| 2013 | 0 | 3 |
| 2014 | 0 | 7 |
| 2015 | 4 | 0 |
| 2016 | 1 | 0 |
| 2017 | 1 | 0 |
| 2018 | 1 | 2 |
| 2019 | 0 | 2 |
| 2020 | 1 | 2 |
| 2021 | 0 | 1 |
| 2022 | 3 | 0 |
| 2023 | 0 | 2 |
| 2024 | 0 | 0 |
| 2025 | 0 | 0 |
| 2026 | 2 | 1 |
By publication year. 2026 runs to 8 Oct.
Recent patents
- Reactor and system for fabrication of free-standing two-dimensional nanostructures using plasma technology18 Aug 2026US 12,709,544 B2Instituto Superior Tecnico
- Remote surface wave propagation for semiconductor chambers5 May 2026US 12,620,553 B2APPLIED Materials.Inc.
- Plasma processing apparatus22 Nov 2022US 11,508,556 B2Tokyo Electron Limited
- Process, reactor and system for fabrication of free-standing two-dimensional nanostructures using plasma technology22 Feb 2022US 11,254,575 B2Instituto Superior Tecnico
- Electric field sensor, surface wave plasma source, and surface wave plasma processing apparatus8 Feb 2022US 11,244,810 B2Tokyo Electron Limited
- Remote Surface Wave Propagation for Semiconductor Chamber13 Aug 2026US 2026/0237603 A1APPLIED Materials.Inc.
- Remote surface wave propagation for semiconductor chambers19 Oct 2023US 2023/0335376 A1APPLIED Materials.Inc.
- Surface coupling induced ionization technique and its corresponding plasma and plasma devices1 Jun 2023US 2023/0171870 A1High-dimensional Plasma Sources Technology (Xiaogan) Co., Ltd.
- Process, reactor and system for fabrication of free-standing two-dimensional nanostructures using plasma technology24 Jun 2021US 2021/0188646 A1Instituto Superior Tecnico
- Electric field sensor, surface wave plasma source, and surface wave plasma processing apparatus19 Nov 2020US 2020/0365371 A1Tokyo Electron Limited
Most cited
By later US patents
- Low electron temperature microwave surface-wave plasma (SWP) processing method and apparatus22US 8,968,588 B2Tokyo Electron Limited · 2015
- System and method for surface decontamination using electromagnetic surface waves8US 7,931,858 B1HRL Laboratories, LLC · 2011
- Device for the excitation of a gas column enclosed in a hollow-core optical fibre4US 9,203,203 B2Universite De Limoges · 2015
- System and method for large scale atmospheric plasma generation3US 8,124,013 B1HRL Laboratories, LLC · 2012
- Adjustable slot antenna for control of uniformity in a surface wave plasma source3US 9,155,183 B2Tokyo Electron Limited · 2015