Reactor and system for fabrication of free-standing two-dimensional nanostructures using plasma technology

A microwave plasma reactor for the production of two dimensional structures of graphene or graphene derivatives, comprising:

• a body, the body being hollow, the body comprises an admission part for admission of a mixture of at least one inert gas and at least one precursor;
• the body including a plasma creation surface wave launching part where surface waves are launched,
• the body including a precursor constituents nucleation part and a transient section, the transient section having a first end and a second end connected, respectively, to the surface wave launching part and to the nucleation part, the transient section providing fluid communication between the plasma creation surface wave launching part and the precursor constituents nucleation part,
• wherein the plasma creation surface wave launching part, the transient section and the precursor constituents nucleation part define, respectively, in the body three inner zones of operation, wherein the first end of the transient section has a cross-sectional area which is smaller than a cross-sectional area of the second end of the transient section, wherein the cross-sectional area of the transient section progressively increases from the first end to the second end and plasma is produced from the surface waves propagating from the plasma creation surface wave launching part and wherein the reactor produces the two dimensional structures of graphene or graphene derivatives.