H05H 1/4622
Using waveguides
Official title: {using waveguides}
H05H1/4622 (Using waveguides) appears on 156 US grants and 198 published applications in this corpus.
Search patents in H05H- Granted patents
- 156
- Published applications
- 198
- Assignees
- 106
- Inventors
- 399
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 3 | 0 |
| 2000 | 1 | 0 |
| 2001 | 3 | 0 |
| 2002 | 5 | 13 |
| 2003 | 9 | 4 |
| 2004 | 5 | 7 |
| 2005 | 4 | 0 |
| 2006 | 0 | 6 |
| 2007 | 3 | 4 |
| 2008 | 0 | 4 |
| 2009 | 2 | 7 |
| 2010 | 3 | 7 |
| 2011 | 1 | 5 |
| 2012 | 1 | 13 |
| 2013 | 6 | 7 |
| 2014 | 8 | 13 |
| 2015 | 6 | 10 |
| 2016 | 11 | 5 |
| 2017 | 8 | 4 |
| 2018 | 5 | 13 |
| 2019 | 13 | 4 |
| 2020 | 10 | 14 |
| 2021 | 6 | 8 |
| 2022 | 6 | 6 |
| 2023 | 5 | 19 |
| 2024 | 13 | 12 |
| 2025 | 12 | 7 |
| 2026 | 6 | 6 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Plasma apparatus and methods for processing feed material utilizing an upstream swirl module and composite gas flows25 Aug 2026US 12,719,024 B26K Inc.
- Magnetically enhanced VUV lamp9 Jun 2026US 12,652,746 B1Uchicago Argonne, LLC
- Method and reactor for processing a gas12 May 2026US 12,624,302 B2Ronda High Tech S.R.L.
- Systems and methods for nonequilibrium plasmas14 Apr 2026US 12,604,388 B2Washington University
- Negative ion source and negative ion generation method24 Feb 2026US 12,558,663 B2Japan Atomic Energy Agency
- Modulated pulsed microwave waveform in a power source for achieving a desired electron energy distribution in a plasma27 Aug 2026US 2026/0255468 A1Starfire Industries LLC
- Powder processing device using microwave torch plasma having high density in edge area2 Jul 2026US 2026/0185203 A1Korea Institute of Fusion Energy
- High power ion beam generator systems and methods30 Apr 2026US 2026/0122758 A1SHINE Technologies, LLC
- High power ion beam generator systems and methods30 Apr 2026US 2026/0122759 A1SHINE Technologies, LLC
- Plasma generating apparatus and plasma processing apparatus26 Mar 2026US 2026/0088253 A1Nissin Inc.
Most cited
By later US patents
- Guided wave applicator with non-gaseous dielectric for plasma chamber191US 9,397,380 B2APPLIED Materials.Inc. · 2016
- Electromagnetic-radiation power-supply mechanism for exciting a coaxial waveguide by using first and second poles and a ring-shaped reflection portion183US 9,072,158 B2Tokyo Electron Limited · 2015
- Plasma nozzle array for providing uniform scalable microwave plasma generation171US 7,806,077 B2Amarante Technologies, Inc. · 2010
- Method and apparatus for producing plasma97US 7,589,470 B2Dublin City University · 2009
- Parallel plate apparatus for in-situ vacuum line cleaning for substrate processing equipment90US 6,193,802 B1APPLIED Materials.Inc. · 2001