H05H 1/0081
By electric means
Official title: {by electric means}
H05H1/0081 (By electric means) appears on 90 US grants and 71 published applications in this corpus.
Search patents in H05H- Granted patents
- 90
- Published applications
- 71
- Assignees
- 63
- Inventors
- 267
- Latest grant
- 14 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 2 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 2 | 0 |
| 1995 | 3 | 0 |
| 1996 | 5 | 0 |
| 1997 | 1 | 0 |
| 1998 | 2 | 0 |
| 1999 | 2 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 3 | 1 |
| 2003 | 2 | 1 |
| 2004 | 2 | 1 |
| 2005 | 0 | 1 |
| 2006 | 0 | 3 |
| 2007 | 2 | 7 |
| 2008 | 3 | 2 |
| 2009 | 4 | 5 |
| 2010 | 5 | 4 |
| 2011 | 2 | 2 |
| 2012 | 2 | 7 |
| 2013 | 3 | 5 |
| 2014 | 4 | 3 |
| 2015 | 7 | 1 |
| 2016 | 3 | 2 |
| 2017 | 2 | 1 |
| 2018 | 1 | 2 |
| 2019 | 2 | 3 |
| 2020 | 4 | 5 |
| 2021 | 3 | 0 |
| 2022 | 3 | 5 |
| 2023 | 1 | 3 |
| 2024 | 6 | 5 |
| 2025 | 4 | 0 |
| 2026 | 1 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Low-k RF rod for RF bias power delivery14 Jul 2026US 12,684,680 B2APPLIED Materials.Inc.
- Waveform detection of states and faults in plasma inverters30 Sep 2025US 12,432,842 B2Atmospheric Plasma Solutions, Inc.
- Measurement apparatus for alternating currents and voltages of physical plasmas, particularly of cold plasmas at atmospheric pressure, and plasma generator comprising such a measurement apparatus24 Jun 2025US 12,340,994 B2Hochschule für angewandte Wissenschaft und Kunst Hildesheim/Holzminden/Göttingen
- MEMS resonator sensor substrate for plasma, temperature, stress, or deposition sensing4 Feb 2025US 12,216,015 B2APPLIED Materials.Inc.
- Langmuir probe operating at fixed voltages4 Feb 2025US 12,219,685 B2Lockheed Martin Corporation
- Method and device for recognizing a process state of a plasma arc method5 Mar 2026US 2026/0068025 A1
- Low-k rf rod for rf bias power delivery8 Jan 2026US 2026/0013029 A1APPLIED Materials.Inc.
- Systems and methods for detecting failure in plasma treatment14 Nov 2024US 2024/0374127 A1Plasmatica Ltd.
- Waveform detection of states and faults in plasma inverters17 Oct 2024US 2024/0349417 A1Atmospheric Plasma Solutions, Inc.
- Mems resonator sensor substrate for plasma, temperature, stress, or deposition sensing28 Mar 2024US 2024/0102876 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Systems and methods for calibrating a switched mode ion energy distribution system102US 9,210,790 B2Advanced Energy Industries, Inc. · 2015
- Baseband V-I probe83US 5,770,922 AENI Technologies, Inc. · 1998
- Aliasing sampler for plasma probe detection45US 5,565,737 AENI, A Division of Astec America, Inc. · 1996
- Method and device for measuring an ion flow in a plasma38US 5,936,413 ACentre National De La Recherche Scientifique · 1999
- Method for monitoring alternating current discharge on a double electrode and apparatus27US 6,420,863 B1Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V. · 2002