H01S 3/2366
Comprising a gas as the active medium
Official title: {comprising a gas as the active medium (H01S3/10092, H01S3/2383 take precedence)}
H01S3/2366 (Comprising a gas as the active medium) appears on 181 US grants and 224 published applications in this corpus.
Search patents in H01S- Granted patents
- 181
- Published applications
- 224
- Assignees
- 34
- Inventors
- 320
- Latest grant
- 16 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 1 | 0 |
| 1981 | 1 | 0 |
| 1982 | 2 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 1 | 0 |
| 1986 | 1 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 4 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 2 | 0 |
| 2002 | 3 | 13 |
| 2003 | 5 | 11 |
| 2004 | 12 | 13 |
| 2005 | 9 | 13 |
| 2006 | 9 | 7 |
| 2007 | 10 | 2 |
| 2008 | 2 | 5 |
| 2009 | 2 | 0 |
| 2010 | 5 | 1 |
| 2011 | 3 | 3 |
| 2012 | 1 | 6 |
| 2013 | 3 | 11 |
| 2014 | 11 | 6 |
| 2015 | 6 | 6 |
| 2016 | 6 | 7 |
| 2017 | 8 | 9 |
| 2018 | 13 | 12 |
| 2019 | 10 | 18 |
| 2020 | 10 | 8 |
| 2021 | 6 | 8 |
| 2022 | 7 | 13 |
| 2023 | 6 | 10 |
| 2024 | 7 | 15 |
| 2025 | 8 | 11 |
| 2026 | 3 | 16 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Gas laser amplifier, gas laser apparatus, EUV light generation apparatus, and EUV exposure apparatus16 Jun 2026US 12,658,664 B2Mitsubishi Electric Corporation
- Optical isolator, ultraviolet laser apparatus, and electronic device manufacturing method3 Feb 2026US 12,541,115 B2Gigaphoton Inc.
- Ultraviolet laser apparatus and electronic device manufacturing method20 Jan 2026US 12,531,387 B2Gigaphoton Inc.
- Bypass apparatus, laser apparatus, and electronic device manufacturing method7 Oct 2025US 12,438,327 B2Gigaphoton Inc.
- Laser device, laser control method, and electronic device manufacturing method23 Sep 2025US 12,424,813 B2Gigaphoton Inc.
- Apparatus and method for acoustic control in a laser chamber20 Aug 2026US 2026/0246220 A1Cymer, Inc.
- Laser device and electronic device manufacturing method23 Jul 2026US 2026/0213485 A1Gigaphoton Inc.
- Gas laser device and electronic device manufacturing method9 Jul 2026US 2026/0196790 A1Gigaphoton Inc.
- Gas laser device and electronic device manufacturing method9 Jul 2026US 2026/0196791 A1Gigaphoton Inc.
- Laser apparatus and electronic device manufacturing method18 Jun 2026US 2026/0171746 A1Gigaphoton Inc.
Most cited
By later US patents
- Very narrow band, two chamber, high rep rate gas discharge laser system144US 6,567,450 B2Cymer, Inc. · 2003
- Very narrow band, two chamber, high rep rate gas discharge laser system136US 6,625,191 B2Cymer, Inc. · 2003
- Injection seeded laser with precise timing control96US 6,549,551 B2Cymer, Inc. · 2003
- Control system for a two chamber gas discharge laser70US 6,690,704 B2Cymer, Inc. · 2004
- Laser lithography light source with beam delivery63US 6,693,939 B2Cymer, Inc. · 2004