Bypass apparatus, laser apparatus, and electronic device manufacturing method

A laser apparatus comprising:

• a laser oscillator configured to output pulse laser light;
• and a pulse width stretching apparatus configured to stretch a pulse width of the pulse laser light having entered the pulse width stretching apparatus, a bypass apparatus being attached to the laser apparatus in a detachable manner, the bypass apparatus constituting a bypass optical path that bypasses the pulse width stretching apparatus,
• the bypass apparatus including
• a plurality of optical elements constituting the bypass optical path, and
• an enclosure that houses the plurality of optical elements,
• the plurality of optical elements including
• a first highly reflective mirror configured to reflect the pulse laser light entering the pulse width stretching apparatus out of the pulse width stretching apparatus, the first highly reflective mirror being configured to guide the reflected pulse laser light to the bypass optical path, and
• a second highly reflective mirror configured to reflect the pulse laser light reflected off the first highly reflective mirror and incident on the second highly reflective mirror through the bypass optical path to cause the reflected pulse laser light to return to a light-exiting-side optical path of the pulse width stretching apparatus.

An electronic device manufacturing method comprising:

• outputting pulse laser light output from a laser apparatus to an exposure apparatus;
• and
• exposing a photosensitive substrate to the pulse laser light in the exposure apparatus to manufacture electronic devices,
• the laser apparatus including a laser oscillator configured to output the pulse laser light and a pulse width stretching apparatus configured to stretch a pulse width of the pulse laser light having entered the pulse width stretching apparatus, a bypass apparatus attached to the laser apparatus in a detachable manner, the bypass apparatus constituting a bypass optical path that bypasses the pulse width stretching apparatus,
• the bypass apparatus including
• a plurality of optical elements constituting the bypass optical path, and
• an enclosure that houses the plurality of optical elements,
• the plurality of optical elements including
• a first highly reflective mirror configured to reflect the pulse laser light entering the pulse width stretching apparatus out of the pulse width stretching apparatus, the first highly reflective mirror being configured to guide the reflected pulse laser light to the bypass optical path, and
• a second highly reflective mirror configured to reflect the pulse laser light reflected off the first highly reflective mirror and incident on the second highly reflective mirror through the bypass optical path to cause the reflected pulse laser light to return to a light-exiting-side optical path of the pulse width stretching apparatus.