H01S 3/2255
Xef, i.e. xenon fluoride is comprised for lasing around 351 nm
Official title: {XeF, i.e. xenon fluoride is comprised for lasing around 351 nm}
H01S3/2255 (Xef, i.e. xenon fluoride is comprised for lasing around 351 nm) appears on 16 US grants and 14 published applications in this corpus.
Search patents in H01S- Granted patents
- 16
- Published applications
- 14
- Assignees
- 13
- Inventors
- 44
- Latest grant
- 26 Aug 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1987 | 2 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 1 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 1 |
| 2006 | 1 | 1 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 0 |
| 2014 | 0 | 0 |
| 2015 | 0 | 0 |
| 2016 | 0 | 0 |
| 2017 | 2 | 5 |
| 2018 | 4 | 1 |
| 2019 | 0 | 0 |
| 2020 | 0 | 0 |
| 2021 | 0 | 1 |
| 2022 | 0 | 3 |
| 2023 | 1 | 0 |
| 2024 | 1 | 1 |
| 2025 | 3 | 1 |
By publication year. Applications have been published since 2001.
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Most cited
By later US patents
- Laser thin film poly-silicon annealing system51US 7,061,959 B2Tcz LLC · 2006
- Injection locking a xenon chloride laser at 308.4 nm31US 4,689,794 ANorthrop Corporation · 1987
- Ultraviolet laser apparatus and gas for ultraviolet laser12US 6,496,527 B1Komatsu Ltd. · 2002
- Optical interferometer with dispersion deviator4US 4,682,893 AComitato Nazionale per la Ricerca e per lo Sviluppo dell'Energie, Nucleare e delle Energie Alternative - ENEA · 1987
- Gas mixture control in a gas discharge light source3US 9,819,136 B2Cymer, Inc. · 2017