Gas mixture control in a gas discharge light source
AssigneeCymer, Inc.
InventorsRahul Ahlawat, Tanuj Aggarwal
Life of this patent
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AssigneeCymer, Inc.
InventorsRahul Ahlawat, Tanuj Aggarwal
Estimating the term…
A gas discharge light source includes a gas discharge system that includes one or more gas discharge chambers. Each of the gas discharge chambers in the gas discharge system is filled with a respective gas mixture. For each gas discharge chamber, a pulsed energy is supplied to the respective gas mixture by activating its associated energy source to thereby produce a pulsed amplified light beam from the gas discharge chamber. One or more properties of the gas discharge system are determined. A gas maintenance scheme is selected from among a plurality of possible schemes based on the determined one or more properties of the gas discharge system. The selected gas maintenance scheme is applied to the gas discharge system. A gas maintenance scheme includes one or more parameters related to adding one or more supplemental gas mixtures to the gas discharge chambers of the gas discharge system.
A method of operating a gas discharge light source comprising a gas discharge system that includes one or more gas discharge chambers, each gas discharge chamber housing an energy source, the method comprising:
A method of operating a gas discharge light source that includes one or more gas discharge chambers, the method comprising:
A gas discharge light source comprising:
Dependencies are inferred from the claim text.